Temperature and Drain-Voltage Effects on Negative Differential Resistance in a 1-D Channel Gate-All-Around FET
We report on the investigation of gate-voltage controlled Negative Differential Resistance (NDR) in a 1D carbon nanotube (CNT) active conducting channel Gate-AllAround Field Effect Transistor (GAAFET). In particular, the effects of temperatures, ranging from 4 K to 450 K, and different drain voltages are explored. It is found that the onset of NDR largely occurs at a specific gate voltage for a particular device topology. The slope of the differential resistance is largely controlled by the drain voltage, with higher drain voltages resulting in a greater slope. The temperature largely influences the current, with lower temperatures resulting in higher currents.
Authors
- Daryoush Shiri (ORCID: https://orcid.org/0000-0001-6115-5821)
- Reza Nekovei (ORCID: https://orcid.org/0000-0002-2173-3161)
- Amit Verma (ORCID: https://orcid.org/0000-0002-1712-1736)
Institutions
- Texas A&M University – Kingsville (US)
- Keysight Technologies (Singapore) (SG)
Publication Details
- Published
- 2025-07-13
- DOI
- https://doi.org/10.1109/nano63165.2025.11113802
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 0.00