A 11T SRAM Circuit Design with Ultra-Low-Voltage for High-Stability Applications
This paper proposes an 11T SRAM cell for sub-threshold operations in 130nm CMOS technology, addressing stability and leakage challenges in low-voltage regimes. By decoupling read/write ports and optimizing transistor sizing, the design eliminates half-select issues and reduces leakage by 2.17× compared to 6T SRAM. Post-layout simulations demonstrate 295 kHz operation at 0.35 V with 0.88×read stability improvement over 8T cells, achieving 1.2 pJ/cycle energy efficiency.
Authors
- Hongjian Li (ORCID: https://orcid.org/0000-0003-0714-0594)
- Lianwen Deng (ORCID: https://orcid.org/0009-0003-6430-2235)
- Jiafeng Ding (ORCID: https://orcid.org/0000-0002-3906-6598)
- Jianqi Qiu (ORCID: https://orcid.org/0000-0001-7541-3983)
- Yihan Yang (ORCID: https://orcid.org/0000-0003-2026-7039)
- Congwei Liao
Institutions
- Central South University (CN)
- Shenzhen Technology University (CN)
Publication Details
- Published
- 2025-05-23
- DOI
- https://doi.org/10.1109/ecis65594.2025.11086956
- Primary Topic
- VLSI and Analog Circuit Testing
- Type
- article
- Field-Weighted Citation Impact
- 0.00