Gate-Tunable Photoresponse in $\text{SnSe}_{2}$ Field Effect Transistors
<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{SnSe}_{2}$</tex>-based devices have emerged as promising candidates for photodetection applications due to their unique optoelectronic properties. As a member of the IVA-VIA group, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{SnSe}_{2}$</tex> offers a combination of direct, indirect and forbidden transitions on its optical absorption edge, making it ideal for optoelectronic applications. In this study, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{SnSe}_{2}$</tex> exhibits excellent conductivity, reaching a maximum current of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$8.83 \mu \mathrm{A}$</tex> at 100 mV, and a field-effect mobility <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 4 \text{cm}^{2} \mathrm{V}^{-1} \mathrm{s}^{-1}$</tex> at room temperature and pressure. Photoresponse analysis revealed a significant increase in drain current during illumination with a white laser, along with persistent photoconductivity. The photocurrent was found to be strongly dependent on the gate voltage, with more pronounced effects observed at negative gate. Analysis of the characteristic times during the excitation and relaxation phases identified two distinct mechanisms: faster indirect band-to-band transitions and slower photoexcitation from intrinsic and extrinsic trap states due to adsorbates or interfacial defects. Times of approximately 1 second, independent of gate voltage, were observed for faster transitions. These results highlight <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{SnSe}_{2}$</tex> 's potential for advanced optoelectronic applications, demonstrating its distinct photo-response behavior and sensitivity to gate voltage modulation.
Authors
- Anna Sessa (ORCID: https://orcid.org/0000-0001-5168-6135)
- Enver Faella (ORCID: https://orcid.org/0000-0002-5782-6685)
- C. S. Lue (ORCID: https://orcid.org/0000-0002-3074-9253)
- M. Passacantando (ORCID: https://orcid.org/0000-0002-3680-5295)
- Martino Aldrigo (ORCID: https://orcid.org/0000-0003-2257-1966)
- Gianluca D’Olimpio (ORCID: https://orcid.org/0000-0002-6367-3945)
- Tsotne Dadiani (ORCID: https://orcid.org/0009-0008-5072-9453)
- S. De Stefano (ORCID: https://orcid.org/0009-0007-8492-0857)
- Cătălin Pârvulescu (ORCID: https://orcid.org/0000-0001-8570-0089)
- O. Durante (ORCID: https://orcid.org/0000-0002-3539-3858)
- Adrian Dinescu (ORCID: https://orcid.org/0000-0002-6216-2035)
- Antonio Politano (ORCID: https://orcid.org/0000-0002-4254-2102)
- Antonio Di Bartolomeo (ORCID: https://orcid.org/0000-0002-3629-726X)
- Chia‐Nung Kuo
Institutions
- University of Salerno (IT)
- University of L'Aquila (IT)
- National Institute for Research and Development in Microtechnologies (RO)
- National Cheng Kung University (TW)
Publication Details
- Published
- 2025-07-13
- DOI
- https://doi.org/10.1109/nano63165.2025.11113713
- Citations
- 1
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.52