Exploring the intrinsic dielectric behavior of SrTiO <sub>3</sub> -based heterostructures: the impact of layer architecture on soft mode dynamics

The design of heterostructures offers opportunities for developing new materials with emergent functionalities and tunable physical properties through layer engineering. However, the underlying mechanisms of interlayer interactions that influence the intrinsic dielectric response in promising multiferroic heterostructures remain largely unexplored. In this study, we investigate the well-defined ferroelectric soft mode in SrTiO<sub>3</sub> (STO), which serves as a benchmark for comparing the intrinsic dielectric properties of STO layers embedded in the potential multiferroic heterostructure of 5 × (50 + 50) nm STO/AlFeO<sub>3</sub> (AFO) with single-layer STO films of similar individual (50 nm) and total (250 nm) thickness. Our findings reveal that increasing the thickness of the STO thin films from 50 nm to 250 nm leads to significant changes in the film microstructure and the degradation of dielectric properties. Notably, the average dielectric response and structural characteristics of the 5 × 50 nm STO layers in the heterostructure remain comparable to those of the single-layer 50 nm STO film, suggesting that the incorporation of intermediate AFO layers effectively mitigates the deterioration of the intrinsic dielectric characteristics of the STO layers. The pronounced temperature-dependent variations in soft mode frequency allow us to propose two potential mechanisms for this effect, which are based on the thermal strain build-up and the formation of defect-induced polar nanoregions. Our study demonstrates that intermediate AFO layers contribute not only magnetic properties to potential multiferroic heterostructures but also enhance the dielectric response, thereby expanding the possibilities of layer engineering.

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Journal
Nanoscale
Published
2025-01-01
DOI
https://doi.org/10.1039/d5nr01753j
Citations
1
Primary Topic
Ferroelectric and Piezoelectric Materials
Type
article
Field-Weighted Citation Impact
0.52

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article

Exploring the intrinsic dielectric behavior of SrTiO 3 -based heterostructures: the impact of layer architecture on soft mode dynamics

Alexander Melentev, С.М. Сутурин, Polina A. Dvortsova, N. S. Sokolov et al.
1 citations
Nanoscale
Ferroelectric and Piezoelectric Materials
0.52
article

Exploring the intrinsic dielectric behavior of SrTiO 3 -based heterostructures: the impact of layer architecture on soft mode dynamics

Alexander Melentev, С.М. Сутурин, Polina A. Dvortsova, N. S. Sokolov, А. А. Левин, Maria A. Kirsanova, М. В. Таланов
article en
1 citations

Abstract

The design of heterostructures offers opportunities for developing new materials with emergent functionalities and tunable physical properties through layer engineering. However, the underlying mechanisms of interlayer interactions that influence the intrinsic dielectric response in promising multiferroic heterostructures remain largely unexplored. In this study, we investigate the well-defined ferroelectric soft mode in SrTiO<sub>3</sub> (STO), which serves as a benchmark for comparing the intrinsic dielectric properties of STO layers embedded in the potential multiferroic heterostructure of 5 × (50 + 50) nm STO/AlFeO<sub>3</sub> (AFO) with single-layer STO films of similar individual (50 nm) and total (250 nm) thickness. Our findings reveal that increasing the thickness of the STO thin films from 50 nm to 250 nm leads to significant changes in the film microstructure and the degradation of dielectric properties. Notably, the average dielectric response and structural characteristics of the 5 × 50 nm STO layers in the heterostructure remain comparable to those of the single-layer 50 nm STO film, suggesting that the incorporation of intermediate AFO layers effectively mitigates the deterioration of the intrinsic dielectric characteristics of the STO layers. The pronounced temperature-dependent variations in soft mode frequency allow us to propose two potential mechanisms for this effect, which are based on the thermal strain build-up and the formation of defect-induced polar nanoregions. Our study demonstrates that intermediate AFO layers contribute not only magnetic properties to potential multiferroic heterostructures but also enhance the dielectric response, thereby expanding the possibilities of layer engineering.

NanoscaleVol. 17(34)
Skolkovo Institute of Science and Technology (RU), Centre of Advanced Studies (RU), Ioffe Institute (RU)
Russian Science Foundation, Ministry of Science and Higher Education of the Russian Federation
Industry, innovation and infrastructure
Openalex Percentile: Top 35%
Ferroelectric and Piezoelectric Materials
0.52
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