High-Resolution Roll-to-Roll Additive Patterning of Functional Materials on Large Areas via Topographic Discontinuous Dewetting

Two-dimensional (2D) arrays of nanoscale functional materials are essential for the advancement of cutting-edge technologies in optics and photonics, optoelectronics, and sensor systems. Conventional fabrication techniques for these structures, however, are limited by high energy consumption, significant waste, and scalability challenges. To address these issues, we demonstrate a roll-to-roll (R2R) additive nanopatterning process, offering a sustainable and scalable solution for large-area, high-resolution production of 2D metamaterials. Our process combines UV-based R2R nanoimprinting and topographical discontinuous dewetting (TDD) to pattern functional inks with feature sizes down to tens of nanometers over large areas. Central to this method is the use of UV-curable Norland Optical Adhesive (NOA) as the imprintable resin. Although the exact composition of NOA is proprietary, this study reveals its thermally switchable wetting properties, transitioning from a high-surface energy state (γ<sub>s</sub> = 36.6 ± 2.3 mJ m<sup>-2</sup>) to a low-surface energy state (γ<sub>s</sub> = 16 ± 0.5 mJ m<sup>-2</sup>) after annealing at 150 °C. This property of NOA enables it to function as an ideal substrate for large-area TDD. During TDD, inks are selectively deposited into the recessed areas of the annealed NOA patterns, while dewetting occurs on the elevated surfaces. The additive nature of this technique significantly reduces ink consumption─requiring only approximately 100 nL for a 10 cm<sup>2</sup> substrate in continuous R2R operations─ensuring that almost all of the functional material is utilized effectively. This method accommodates a wide array of functional materials, such as metals, semiconductors, and dielectrics, and allows for control over pattern thickness and multilayer configurations. Focusing on sustainability and scalability, the proposed additive R2R nanopatterning technique enables eco-friendly large-area production of nanoscale functional materials, driving progress in metamaterials, optoelectronics, and other advanced fields.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2025-08-14
DOI
https://doi.org/10.1021/acsami.5c09721
Citations
1
Primary Topic
Nanomaterials and Printing Technologies
Type
article
Field-Weighted Citation Impact
0.73

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article

High-Resolution Roll-to-Roll Additive Patterning of Functional Materials on Large Areas via Topographic Discontinuous Dewetting

Maya Ramamurthy, Yidenekachew J. Donie, Vivian E. Ferry, C. Daniel Frisbie et al.
1 citations
ACS Applied Materials & Interfaces
Nanomaterials and Printing Technologies
0.73
article

High-Resolution Roll-to-Roll Additive Patterning of Functional Materials on Large Areas via Topographic Discontinuous Dewetting

Maya Ramamurthy, Yidenekachew J. Donie, Vivian E. Ferry, C. Daniel Frisbie, Lorraine Falter Francis, Iona Welsch
article en
1 citations

Abstract

Two-dimensional (2D) arrays of nanoscale functional materials are essential for the advancement of cutting-edge technologies in optics and photonics, optoelectronics, and sensor systems. Conventional fabrication techniques for these structures, however, are limited by high energy consumption, significant waste, and scalability challenges. To address these issues, we demonstrate a roll-to-roll (R2R) additive nanopatterning process, offering a sustainable and scalable solution for large-area, high-resolution production of 2D metamaterials. Our process combines UV-based R2R nanoimprinting and topographical discontinuous dewetting (TDD) to pattern functional inks with feature sizes down to tens of nanometers over large areas. Central to this method is the use of UV-curable Norland Optical Adhesive (NOA) as the imprintable resin. Although the exact composition of NOA is proprietary, this study reveals its thermally switchable wetting properties, transitioning from a high-surface energy state (γ<sub>s</sub> = 36.6 ± 2.3 mJ m<sup>-2</sup>) to a low-surface energy state (γ<sub>s</sub> = 16 ± 0.5 mJ m<sup>-2</sup>) after annealing at 150 °C. This property of NOA enables it to function as an ideal substrate for large-area TDD. During TDD, inks are selectively deposited into the recessed areas of the annealed NOA patterns, while dewetting occurs on the elevated surfaces. The additive nature of this technique significantly reduces ink consumption─requiring only approximately 100 nL for a 10 cm<sup>2</sup> substrate in continuous R2R operations─ensuring that almost all of the functional material is utilized effectively. This method accommodates a wide array of functional materials, such as metals, semiconductors, and dielectrics, and allows for control over pattern thickness and multilayer configurations. Focusing on sustainability and scalability, the proposed additive R2R nanopatterning technique enables eco-friendly large-area production of nanoscale functional materials, driving progress in metamaterials, optoelectronics, and other advanced fields.

ACS Applied Materials & InterfacesVol. 17(38)
University of Minnesota (US), University of Minnesota System (US)
National Science Foundation, Division of Materials Research, Division of Electrical, Communications and Cyber Systems
Openalex Percentile: Top 25%
Nanomaterials and Printing Technologies
0.73
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