PZ-Agent: A Symbolic-Engine Enhanced LLM Agent for Op-Amp Topology Inquisition

Using large language models (LLMs) for EDA is a rising research interest. In this paper, we investigate whether a symbolic tool assisted LLM agent is capable of offering circuit-level inference in the analog domain. We develop a framework to inject pole-zero (PZ) knowledge into a LLM-based multi-agent system, hoping that this PZ-agent so formed can handle Op-amp topology inquisition. We demonstrate in details that analytical knowledge in the PZ form should be properly condensed to better the reasoning capability of the PZ-agent. It turns out that, with proper incorporated knowledge, the PZ-agent is capable of answering designer’s inquiries on certain sophisticated multistage Op-amp design issues.

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Publication Details

Published
2025-05-09
DOI
https://doi.org/10.1109/iseda65950.2025.11100744
Primary Topic
Advancements in Photolithography Techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

PZ-Agent: A Symbolic-Engine Enhanced LLM Agent for Op-Amp Topology Inquisition

Mingzhen Li, Ting Yang, Guoyong Shi, Bo Li
Advancements in Photolithography Techniques
article

PZ-Agent: A Symbolic-Engine Enhanced LLM Agent for Op-Amp Topology Inquisition

Mingzhen Li, Ting Yang, Guoyong Shi, Bo Li
article en

Abstract

Using large language models (LLMs) for EDA is a rising research interest. In this paper, we investigate whether a symbolic tool assisted LLM agent is capable of offering circuit-level inference in the analog domain. We develop a framework to inject pole-zero (PZ) knowledge into a LLM-based multi-agent system, hoping that this PZ-agent so formed can handle Op-amp topology inquisition. We demonstrate in details that analytical knowledge in the PZ form should be properly condensed to better the reasoning capability of the PZ-agent. It turns out that, with proper incorporated knowledge, the PZ-agent is capable of answering designer’s inquiries on certain sophisticated multistage Op-amp design issues.

Xidian University (CN), Shanghai Jiao Tong University (CN)
Huawei Technologies
Peace, Justice and strong institutions
Openalex Percentile: Top 81%
Advancements in Photolithography Techniques
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