FLPlace: Macro Placement with Forward-Looking Wire Mask Guidance

The development of Very Large Scale Integration (VLSI) technology has introduced new challenges for Electronic Design Automation (EDA) in chip placement. Macro placement is a crucial subproblem in the placement process, focused on determining the positions of all macros to minimize halfperimeter wire length (HPWL) while avoiding overlaps. Recently, wire-mask-guided macro placement methods have shown the potential to achieve promising results for macro placement. However, these methods are prone to getting stuck in local optima, as they focus solely on selecting the current optimal position for placing a macro. In this paper, we proposed a wiremask-guided macro placement method called FLPlace. Firstly, we presented a forward-looking wire-mask-guided algorithm that accounts for the impact of the current macro’s position on subsequent macros, thus optimizing the overall layout. Secondly, we introduced a heuristic space exploration strategy to enhance optimization efficiency. Experimental results on the ISPD2005 and ariane benchmark demonstrate that FLPlace outperforms the wire-mask-guided method WireMask-Bbo, achieving an 11.71% optimization in HPWL and converging to a high-quality solution more rapidly.

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Published
2025-05-09
DOI
https://doi.org/10.1109/iseda65950.2025.11100538
Primary Topic
Advancements in Photolithography Techniques
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article
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article

FLPlace: Macro Placement with Forward-Looking Wire Mask Guidance

Yue Wu, Xiaoyan Yang, Chuan‐Mu Chen
Advancements in Photolithography Techniques
article

FLPlace: Macro Placement with Forward-Looking Wire Mask Guidance

Yue Wu, Xiaoyan Yang, Chuan‐Mu Chen
article en

Abstract

The development of Very Large Scale Integration (VLSI) technology has introduced new challenges for Electronic Design Automation (EDA) in chip placement. Macro placement is a crucial subproblem in the placement process, focused on determining the positions of all macros to minimize halfperimeter wire length (HPWL) while avoiding overlaps. Recently, wire-mask-guided macro placement methods have shown the potential to achieve promising results for macro placement. However, these methods are prone to getting stuck in local optima, as they focus solely on selecting the current optimal position for placing a macro. In this paper, we proposed a wiremask-guided macro placement method called FLPlace. Firstly, we presented a forward-looking wire-mask-guided algorithm that accounts for the impact of the current macro’s position on subsequent macros, thus optimizing the overall layout. Secondly, we introduced a heuristic space exploration strategy to enhance optimization efficiency. Experimental results on the ISPD2005 and ariane benchmark demonstrate that FLPlace outperforms the wire-mask-guided method WireMask-Bbo, achieving an 11.71% optimization in HPWL and converging to a high-quality solution more rapidly.

Hangzhou Dianzi University (CN)
Openalex Percentile: Top 81%
Advancements in Photolithography Techniques
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FLPlace: Macro Placement with Forward-Looking Wire Mask Guidance — Yue Wu, Xiaoyan Yang, et al. · (2025) | TGRS Research Map | TGRS