High Power-Added-Efficiency AlGaN/GaN E-Mode HEMTs for Low-Supply-Voltage RF Terminal Applications
In this paper, an enhancement-mode (E-mode) GaN high electron mobility transistors (HEMTs) with an innovational inverted trapezoidal recessed-gate is successfully fabricated by using a developed variable pressure gate etching process, which contributes to a 0.41 V positive threshold voltage <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\left(\mathrm{V}_{\text {TH }}\right)$</tex> and a significant saturation output current density (IDMAX) of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$0.94 ~\mathrm{A} / \text{mm}$</tex>. the device employing <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$0.2-\mu \mathrm{m}$</tex> T-gate length exhibits a high peak transconductance (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$G_{\text {mmax }}$</tex>) of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$577.6 \text{mS} / \text{mm}$</tex> and a power gain cut-off frequency (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$f_{\text {max }}$</tex>) of 138 GHz. At 18 GHz, a record power-added-efficiency (PAE) of 70 % associated with a high output power density of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$2.22 ~\mathrm{W} / \text{mm}$</tex> is realized in a continuous-wave (CW) mode at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$V_{\text {DS }}=12 ~\mathrm{V}$</tex>. Compared with others E-mode structure, the improved E-mode GaN HEMTs demonstrates a great potential in Low-Supply-Voltage RF terminal applications.
Authors
- Ruizhe Zhang (ORCID: https://orcid.org/0000-0002-6937-7653)
- Kaiyu Wang (ORCID: https://orcid.org/0009-0002-0275-0123)
- Jiaqi Guo (ORCID: https://orcid.org/0009-0009-9968-7714)
- Rikang Zhao (ORCID: https://orcid.org/0000-0001-7170-9744)
- Yankui Li (ORCID: https://orcid.org/0000-0001-8048-0910)
- Ke Wei (ORCID: https://orcid.org/0000-0002-7616-3493)
- Sheng Zhang (ORCID: https://orcid.org/0009-0008-1782-2541)
- Xiaoqiang He (ORCID: https://orcid.org/0009-0006-6384-3517)
- Weijun Luo (ORCID: https://orcid.org/0000-0002-2770-2358)
- Xinhua Wang
- Xinyu Liu (ORCID: https://orcid.org/0009-0007-2535-5800)
- Jiebin Niu (ORCID: https://orcid.org/0009-0009-6299-0947)
- Jianchao Wang (ORCID: https://orcid.org/0009-0001-3239-1160)
Institutions
- Chinese Academy of Sciences (CN)
- Institute of Microelectronics (CN)
Publication Details
- Published
- 2025-06-15
- DOI
- https://doi.org/10.1109/ims40360.2025.11103892
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00