Electrothermal Simulation and Vertical Interconnect Planning for Integrated Chiplets
Chiplets are emerging as novel solutions for high-performance AI computing processors. Vertical interconnects (VICs) including μbumps, C4 bumps and through-silicon vias (TSVs) in chiplets are critical as they not only carry signals and power supplies but also transfer heat efficiently. Due to the need of fine-grained VIC modeling, existing thermal tools are ineffective for VIC-embedded chiplets. Moreover, electrothermal analysis in previous architectural simulators does not consider temperature dependence for short-circuit power, which is nontrivial in our experiments. To address the above problems, this paper proposes SYSgen, a framework for accurate, location-based temperature-dependent power profiling and VIC planning for integrated chiplets. SYSgen achieves a 97.77× speedup with a maximum error below 1.2°C when the chiplet temperature is around 100°C compared to COMSOL. It also reduces VIC number by 21.7% and 12.4% compared to two existing papers with same constraints on signal and power routing and maximum temperature.
Authors
- Lei He (ORCID: https://orcid.org/0000-0002-5266-3805)
- Wu Chen (ORCID: https://orcid.org/0000-0002-5376-8123)
- Li Zhu (ORCID: https://orcid.org/0000-0001-8588-9379)
- Yiyu Zhou (ORCID: https://orcid.org/0000-0001-5543-9211)
- Ting-Jung Lin (ORCID: https://orcid.org/0000-0002-5208-482X)
- Teng Lu (ORCID: https://orcid.org/0000-0002-7229-1383)
- Wenkai Yang
- Siyuan Miao
- Zhiping Yu
Institutions
- Ningbo University of Technology (CN)
- Institute for Advanced Study (DE)
- Tsinghua University (CN)
Publication Details
- Published
- 2025-05-09
- DOI
- https://doi.org/10.1109/iseda65950.2025.11100500
- Primary Topic
- Low-power high-performance VLSI design
- Type
- article
- Field-Weighted Citation Impact
- 0.00