Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via
2.5D chiplet-based systems, integrating heterogeneous chiplets manufactured at disparate technology nodes, have emerged as a promising solution for balancing cost and performance. However, thermal management remains a critical challenge. This study systematically investigates thermal-aware design optimization for chiplet-based systems through placement strategy analysis and thermal through silicon via (TTSV) parameters optimization. Six distinct chiplet placements are evaluated for a nine-chiplets system using finite element method (FEM) thermal simulations. Subsequent TTSV parametric analysis reveals an inverse correlation between via density and peak operating temperature, showing up to 15.5% thermal reduction in high-power scenarios. Simulation data identify feasible TTSV configurations (via-to-area ratio vs. peak temperature) within safe operating limits. This work provides empirical guidance for early-stage thermal design, emphasizing the interplay between chiplet and vertical interconnect density to ensure both performance and reliability in advanced packaging architectures.
Authors
- Tao Zou (ORCID: https://orcid.org/0000-0002-6510-5749)
- Jiayao Wu (ORCID: https://orcid.org/0009-0000-5733-3680)
- Ruotong Liu (ORCID: https://orcid.org/0000-0002-4861-7160)
- Fei Liu (ORCID: https://orcid.org/0000-0003-3212-7594)
- Weisong Shi (ORCID: https://orcid.org/0000-0001-5864-4675)
- Yijiao Wang
- Weisheng Zhao (ORCID: https://orcid.org/0000-0001-8021-7434)
Institutions
- Peking University (CN)
- Beihang University (CN)
Publication Details
- Published
- 2025-05-09
- DOI
- https://doi.org/10.1109/iseda65950.2025.11101238
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China