Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via

2.5D chiplet-based systems, integrating heterogeneous chiplets manufactured at disparate technology nodes, have emerged as a promising solution for balancing cost and performance. However, thermal management remains a critical challenge. This study systematically investigates thermal-aware design optimization for chiplet-based systems through placement strategy analysis and thermal through silicon via (TTSV) parameters optimization. Six distinct chiplet placements are evaluated for a nine-chiplets system using finite element method (FEM) thermal simulations. Subsequent TTSV parametric analysis reveals an inverse correlation between via density and peak operating temperature, showing up to 15.5% thermal reduction in high-power scenarios. Simulation data identify feasible TTSV configurations (via-to-area ratio vs. peak temperature) within safe operating limits. This work provides empirical guidance for early-stage thermal design, emphasizing the interplay between chiplet and vertical interconnect density to ensure both performance and reliability in advanced packaging architectures.

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Publication Details

Published
2025-05-09
DOI
https://doi.org/10.1109/iseda65950.2025.11101238
Primary Topic
3D IC and TSV technologies
Type
article
Field-Weighted Citation Impact
0.00

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article

Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via

Tao Zou, Jiayao Wu, Ruotong Liu, Fei Liu et al.
3 links
3D IC and TSV technologies
article

Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via

Tao Zou, Jiayao Wu, Ruotong Liu, Fei Liu, Weisong Shi, Yijiao Wang, Weisheng Zhao
article en

Abstract

2.5D chiplet-based systems, integrating heterogeneous chiplets manufactured at disparate technology nodes, have emerged as a promising solution for balancing cost and performance. However, thermal management remains a critical challenge. This study systematically investigates thermal-aware design optimization for chiplet-based systems through placement strategy analysis and thermal through silicon via (TTSV) parameters optimization. Six distinct chiplet placements are evaluated for a nine-chiplets system using finite element method (FEM) thermal simulations. Subsequent TTSV parametric analysis reveals an inverse correlation between via density and peak operating temperature, showing up to 15.5% thermal reduction in high-power scenarios. Simulation data identify feasible TTSV configurations (via-to-area ratio vs. peak temperature) within safe operating limits. This work provides empirical guidance for early-stage thermal design, emphasizing the interplay between chiplet and vertical interconnect density to ensure both performance and reliability in advanced packaging architectures.

Peking University (CN), Beihang University (CN)
National Natural Science Foundation of China
Industry, innovation and infrastructure
Openalex Percentile: Top 81%
3D IC and TSV technologies
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Thermal Modeling and Improvement of 2.5D Chiplet-based Heterogeneous System with Thermal Through Silicon Via — Tao Zou, Jiayao Wu, et al. · (2025) | TGRS Research Map | TGRS