25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe's diffraction limit), aspect ratios greater than 10<sup>4</sup>:1, and large-area holey lattices spanning 10 mm<sup>2</sup> with potential scalability up to several cm<sup>2</sup>. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.

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Publication Details

Journal
Nature Communications
Published
2025-08-12
DOI
https://doi.org/10.1038/s41467-025-62426-1
Citations
30
Primary Topic
Laser Material Processing Techniques
Type
article
Field-Weighted Citation Impact
40.04

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25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

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30 citations
Nature Communications
Laser Material Processing Techniques
40.04
article

25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

Jianrong Qiu, Jingyu Zhang, Huijiao Ji, Zhijun Ma, Guoping Dong, Giuseppe Barillaro, Beibei Xu, H. H. He, Jianbei Qiu, Chen Zou, Lijing Zhong, Cheng‐Wei Qiu, Xiaofeng Liu, Yuying Wang, Xiangyu Sun, Yihui Fu, Zhemin Wu, Zhi Chen
article en
30 citations

Abstract

One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe's diffraction limit), aspect ratios greater than 10<sup>4</sup>:1, and large-area holey lattices spanning 10 mm<sup>2</sup> with potential scalability up to several cm<sup>2</sup>. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.

Nature CommunicationsVol. 16(1)
Kunming University of Science and Technology (CN), University of Pisa (IT), Ningbo University (CN), Piaggio (Italy) (IT), Kunming University (CN), Ningbo University of Technology (CN), National University of Singapore (SG), Southwest Medical University (CN), Zhejiang Lab (CN), Peng Cheng Laboratory (CN), Wuhan National Laboratory for Optoelectronics (CN), Huazhong University of Science and Technology (CN), Zhejiang University (CN), South China University of Technology (CN)
Westlake University, National Natural Science Foundation of China, Zhejiang University, South China University of Technology, State Key Laboratory of Luminescent Materials and Devices, Natural Science Foundation of Zhejiang Province
Industry, innovation and infrastructure
Openalex Percentile: Top 0%
Laser Material Processing Techniques
40.04
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