Defect-Rich Cu<sub>2</sub>O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes

Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-Cu<sub>2</sub>O) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-Cu<sub>2</sub>O, in the presence of H<sub>2</sub>O<sub>2</sub>, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control Cu<sub>2</sub>O for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-Cu<sub>2</sub>O significantly enhanced Cu(III) generation when reacting with H<sub>2</sub>O<sub>2</sub> compared to control Cu<sub>2</sub>O. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-Cu<sub>2</sub>O enhance H<sub>2</sub>O<sub>2</sub> adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.

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Journal
ACS Nano
Published
2025-08-12
DOI
https://doi.org/10.1021/acsnano.5c06402
Citations
4
Primary Topic
Copper-based nanomaterials and applications
Type
article
Field-Weighted Citation Impact
2.07

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Defect-Rich Cu2O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes

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article

Defect-Rich Cu2O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes

Juri Lee, Erwin Jongwoo Park, Taeghwan Hyeon, Changha Lee, Kang Kim, Dong‐Won Kang, Alex Taekyung Lee, Jiyoon Cho, Yeongjae Kim, Jae Wook Lee, Joohyun Kim, Maeng‐Joon Jung
article en
4 citations

Abstract

Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-Cu<sub>2</sub>O) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-Cu<sub>2</sub>O, in the presence of H<sub>2</sub>O<sub>2</sub>, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control Cu<sub>2</sub>O for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-Cu<sub>2</sub>O significantly enhanced Cu(III) generation when reacting with H<sub>2</sub>O<sub>2</sub> compared to control Cu<sub>2</sub>O. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-Cu<sub>2</sub>O enhance H<sub>2</sub>O<sub>2</sub> adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.

ACS NanoVol. 19(33)
Yale University (US), National University (SD), Institute for Basic Science (KR), Center for Genomic Science (IT), Ulsan National Institute of Science and Technology (KR)
National Research Foundation of Korea, Institute for Basic Science
Openalex Percentile: Top 12%
Copper-based nanomaterials and applications
2.07
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