Defect-Rich Cu<sub>2</sub>O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes
Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-Cu<sub>2</sub>O) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-Cu<sub>2</sub>O, in the presence of H<sub>2</sub>O<sub>2</sub>, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control Cu<sub>2</sub>O for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-Cu<sub>2</sub>O significantly enhanced Cu(III) generation when reacting with H<sub>2</sub>O<sub>2</sub> compared to control Cu<sub>2</sub>O. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-Cu<sub>2</sub>O enhance H<sub>2</sub>O<sub>2</sub> adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-Cu<sub>2</sub>O/H<sub>2</sub>O<sub>2</sub> system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.
Authors
- Juri Lee
- Erwin Jongwoo Park (ORCID: https://orcid.org/0000-0002-2323-3435)
- Taeghwan Hyeon (ORCID: https://orcid.org/0000-0001-5959-6257)
- Changha Lee (ORCID: https://orcid.org/0000-0002-0404-9405)
- Kang Kim (ORCID: https://orcid.org/0000-0002-7047-3183)
- Dong‐Won Kang (ORCID: https://orcid.org/0000-0002-4818-8108)
- Alex Taekyung Lee (ORCID: https://orcid.org/0000-0002-6637-8984)
- Jiyoon Cho (ORCID: https://orcid.org/0000-0003-4292-3981)
- Yeongjae Kim (ORCID: https://orcid.org/0000-0002-5676-294X)
- Jae Wook Lee (ORCID: https://orcid.org/0000-0002-8756-0195)
- Joohyun Kim (ORCID: https://orcid.org/0000-0003-2676-2532)
- Maeng‐Joon Jung
Institutions
- Yale University (US)
- National University (SD)
- Institute for Basic Science (KR)
- Center for Genomic Science (IT)
- Ulsan National Institute of Science and Technology (KR)
Publication Details
- Journal
- ACS Nano
- Published
- 2025-08-12
- DOI
- https://doi.org/10.1021/acsnano.5c06402
- Citations
- 4
- Primary Topic
- Copper-based nanomaterials and applications
- Type
- article
- Field-Weighted Citation Impact
- 2.07
Funders
- National Research Foundation of Korea
- Institute for Basic Science