Optimization Study of Thermal Management of Domestic SiC Power Semiconductor Based on Improved Genetic Algorithm

To enhance thermal management efficiency of domestic SiC power semiconductor devices under high heat density, a multi-parameter co-optimization model based on an improved genetic algorithm is proposed. This model integrates thermal-structural-fluid coupling among package structure, heat dissipation interface, and cooling system. A multi-objective fitness function, combined with the NSGA-II algorithm, minimizes thermal resistance, junction temperature, and response time. Based on thermal network modeling, structure simplification and parameter extraction are performed. Experimental validation shows the optimized system significantly reduces steady-state junction temperature and response delay, enhancing dynamic adaptability and thermal safety, with strong potential for engineering applications.

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Publication Details

Published
2025-05-23
DOI
https://doi.org/10.1109/etae65337.2025.11089826
Citations
7
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
5.11
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article

Optimization Study of Thermal Management of Domestic SiC Power Semiconductor Based on Improved Genetic Algorithm

Guoping Xu, Hongjing Liang, Liang Yu, Shangxi Li et al.
7 citations
Silicon Carbide Semiconductor Technologies
5.11
article

Optimization Study of Thermal Management of Domestic SiC Power Semiconductor Based on Improved Genetic Algorithm

Guoping Xu, Hongjing Liang, Liang Yu, Shangxi Li, Feng Chen
article en
7 citations

Abstract

To enhance thermal management efficiency of domestic SiC power semiconductor devices under high heat density, a multi-parameter co-optimization model based on an improved genetic algorithm is proposed. This model integrates thermal-structural-fluid coupling among package structure, heat dissipation interface, and cooling system. A multi-objective fitness function, combined with the NSGA-II algorithm, minimizes thermal resistance, junction temperature, and response time. Based on thermal network modeling, structure simplification and parameter extraction are performed. Experimental validation shows the optimized system significantly reduces steady-state junction temperature and response delay, enhancing dynamic adaptability and thermal safety, with strong potential for engineering applications.

Shenzhen Metro (China) (CN), BBK Electronics (China) (CN), Shenzhen Technology University (CN)
Openalex Percentile: Top 4%
Silicon Carbide Semiconductor Technologies
5.11
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Optimization Study of Thermal Management of Domestic SiC Power Semiconductor Based on Improved Genetic Algorithm — Guoping Xu, Hongjing Liang, et al. · (2025) | TGRS Research Map | TGRS