Optimization Study of Thermal Management of Domestic SiC Power Semiconductor Based on Improved Genetic Algorithm
To enhance thermal management efficiency of domestic SiC power semiconductor devices under high heat density, a multi-parameter co-optimization model based on an improved genetic algorithm is proposed. This model integrates thermal-structural-fluid coupling among package structure, heat dissipation interface, and cooling system. A multi-objective fitness function, combined with the NSGA-II algorithm, minimizes thermal resistance, junction temperature, and response time. Based on thermal network modeling, structure simplification and parameter extraction are performed. Experimental validation shows the optimized system significantly reduces steady-state junction temperature and response delay, enhancing dynamic adaptability and thermal safety, with strong potential for engineering applications.
Authors
- Guoping Xu (ORCID: https://orcid.org/0000-0003-1431-7191)
- Hongjing Liang (ORCID: https://orcid.org/0000-0003-1480-1872)
- Liang Yu (ORCID: https://orcid.org/0009-0007-3922-3454)
- Shangxi Li
- Feng Chen
Institutions
- Shenzhen Metro (China) (CN)
- BBK Electronics (China) (CN)
- Shenzhen Technology University (CN)
Publication Details
- Published
- 2025-05-23
- DOI
- https://doi.org/10.1109/etae65337.2025.11089826
- Citations
- 7
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 5.11