Ge/GeSn <i>p-n-i-p</i> heterojunction phototransistor for short-wave infrared applications

In this work, the proposed two-terminal <i>p-n-i-p</i> GeSn heterojunction bipolar phototransistors (HPT) are fabricated using the molecular beam epitaxy technique on a Si substrate with a Ge virtual substrate. The proposed device aims to address the current growth challenges and the low experimental responsivity value of the GeSn HPT in the short-wave infrared (SWIR) bands. To investigate the impact of Sn content on the optical and electrical characteristics of GeSn HPTs, we grow four different samples with Sn concentration varying between 0% and 6.5% for performance comparison. The electrical characterization measurements indicate a reduced dark current density and demonstrate breakdown at voltages exceeding 6 V during forward operation. This observation is favorable, as the bias voltage is significantly lower than required for avalanche photodiodes to enter the breakdown region. The electro-optical characterization indicates a high collector current when exposed to illumination at a wavelength λ = 1310 nm, demonstrating a notable increase in response with the rise in incident optical power, enhancing the optical responsivity. Moreover, as the Sn concentration increases in the i-GeSn active layer, the measured responsivity spectra of the fabricated HPTs exhibit an improvement because of the increased absorption coefficient. Furthermore, increased Sn concentration also leads to a redshift in the cut-off (detection) wavelength. At λ = 1310 nm, the fabricated HPTs (6.5% Sn) achieve an optical responsivity of 4.77 A/W with an optical power of P<sub>opt</sub> = 1 mW and V<sub>EC</sub> = 4 V, surpassing the performance of recently reported GeSn photodetectors and HPTs, making it the highest responsivity recorded among all reported PDs and HPTs. Therefore, the high-quality grown layer and electro-optical performance, along with the benchmark results, demonstrate the efficacy of our fabricated GeSn HPTs and indicate their potential applications in SWIR bands, including communication and sensing, among others.

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Publication Details

Journal
Optics Express
Published
2025-07-25
DOI
https://doi.org/10.1364/oe.572623
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Ge/GeSn p-n-i-p heterojunction phototransistor for short-wave infrared applications

Daniel Schwarz, Harshvardhan Kumar, Michael Oehme, Sören Schäfer et al.
Optics Express
Photonic and Optical Devices
article

Ge/GeSn p-n-i-p heterojunction phototransistor for short-wave infrared applications

Daniel Schwarz, Harshvardhan Kumar, Michael Oehme, Sören Schäfer, Christian Spieth, Alwin Daus, Maurice Wanitzek
article en

Abstract

In this work, the proposed two-terminal <i>p-n-i-p</i> GeSn heterojunction bipolar phototransistors (HPT) are fabricated using the molecular beam epitaxy technique on a Si substrate with a Ge virtual substrate. The proposed device aims to address the current growth challenges and the low experimental responsivity value of the GeSn HPT in the short-wave infrared (SWIR) bands. To investigate the impact of Sn content on the optical and electrical characteristics of GeSn HPTs, we grow four different samples with Sn concentration varying between 0% and 6.5% for performance comparison. The electrical characterization measurements indicate a reduced dark current density and demonstrate breakdown at voltages exceeding 6 V during forward operation. This observation is favorable, as the bias voltage is significantly lower than required for avalanche photodiodes to enter the breakdown region. The electro-optical characterization indicates a high collector current when exposed to illumination at a wavelength λ = 1310 nm, demonstrating a notable increase in response with the rise in incident optical power, enhancing the optical responsivity. Moreover, as the Sn concentration increases in the i-GeSn active layer, the measured responsivity spectra of the fabricated HPTs exhibit an improvement because of the increased absorption coefficient. Furthermore, increased Sn concentration also leads to a redshift in the cut-off (detection) wavelength. At λ = 1310 nm, the fabricated HPTs (6.5% Sn) achieve an optical responsivity of 4.77 A/W with an optical power of P<sub>opt</sub> = 1 mW and V<sub>EC</sub> = 4 V, surpassing the performance of recently reported GeSn photodetectors and HPTs, making it the highest responsivity recorded among all reported PDs and HPTs. Therefore, the high-quality grown layer and electro-optical performance, along with the benchmark results, demonstrate the efficacy of our fabricated GeSn HPTs and indicate their potential applications in SWIR bands, including communication and sensing, among others.

Optics ExpressVol. 33(16)
LNM Institute of Information Technology (IN)
Deutsche Forschungsgemeinschaft
Openalex Percentile: Top 82%
Photonic and Optical Devices
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