2D ferroelectric narrow-bandgap semiconductor Wurtzite’ type α-In2Se3 and its silicon-compatible growth
2D van der Waals ferroelectrics, particularly α-In<sub>2</sub>Se<sub>3</sub>, have emerged as an attractive building block for next-generation information storage technologies due to their moderate band gap and robust ferroelectricity stabilized by dipole locking. α-In<sub>2</sub>Se<sub>3</sub> can adopt either the distorted zincblende or wurtzite structures; however, the wurtzite phase has yet to be experimentally validated, and its large-scale synthesis poses significant challenges. Here, we report an in-situ transport growth of centimeter-scale wurtzite type α-In<sub>2</sub>Se<sub>3</sub> films directly on SiO<sub>2</sub> substrates using a process combining pulsed laser deposition and chemical vapor deposition. We demonstrate that it is a narrow bandgap ferroelectric semiconductor, featuring a Curie temperature exceeding 620 K, a tunable bandgap (0.8-1.6 eV) modulated by charged domain walls, and a large optical absorption coefficient of 1.3 × 10<sup>6</sup>/cm. Moreover, light absorption promotes the dynamic conductance range, linearity, and symmetry of the synapse devices, leading to a high recognition accuracy of 92.3% in a supervised pattern classification task for neuromorphic computing. Our findings demonstrate a ferroelectric polymorphism of In<sub>2</sub>Se<sub>3</sub>, highlighting its potential in ferroelectric synapses for neuromorphic computing.
Authors
- Weijin Hu (ORCID: https://orcid.org/0000-0001-5862-1481)
- Kepeng Song (ORCID: https://orcid.org/0000-0003-3860-5761)
- Yizhuo Li (ORCID: https://orcid.org/0009-0004-8871-192X)
- Biaohong Huang
- Zhen Fan (ORCID: https://orcid.org/0000-0002-1756-641X)
- Jianhang Qiu (ORCID: https://orcid.org/0000-0002-7029-1523)
- Xiaofei Zhu (ORCID: https://orcid.org/0000-0002-1268-2948)
- Fei Xue (ORCID: https://orcid.org/0000-0001-9039-7088)
- Sajjad Ali (ORCID: https://orcid.org/0000-0002-0134-5217)
- Yuxuan Jiang (ORCID: https://orcid.org/0000-0001-7971-8354)
- Teng Yang (ORCID: https://orcid.org/0000-0003-3773-7586)
- Lain‐Jong Li (ORCID: https://orcid.org/0000-0002-4059-7783)
- Xingkun Ning (ORCID: https://orcid.org/0000-0002-0121-9632)
- Chengbing Qin (ORCID: https://orcid.org/0000-0002-6822-5113)
- Gang Yu Liu (ORCID: https://orcid.org/0000-0002-6946-7552)
- Bing Li (ORCID: https://orcid.org/0000-0002-0132-5021)
- Zhidong Zhang (ORCID: https://orcid.org/0000-0002-6203-0171)
- Qiankun Li (ORCID: https://orcid.org/0000-0002-4822-2425)
- Renhui Liu
- Haoyue Deng
Institutions
- University of Science and Technology of China (CN)
- Prince Sultan University (SA)
- Shandong University (CN)
- Shenyang University of Technology (CN)
- National University of Singapore (SG)
- Shanxi University (CN)
- South China Normal University (CN)
- Chinese Academy of Sciences (CN)
- University of Jinan (CN)
- Soochow University (CN)
- Institute of Metal Research (CN)
- International Centre for Materials Physics (CN)
- Hebei University (CN)
- Zhejiang University (CN)
Publication Details
- Journal
- Nature Communications
- Published
- 2025-08-09
- DOI
- https://doi.org/10.1038/s41467-025-62822-7
- Citations
- 16
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 8.28
Funders
- Shandong University
- National University of Singapore
- National Natural Science Foundation of China
- Chinese Academy of Sciences
- South China Normal University
- Shanxi University
- Zhejiang University
- Soochow University
- Hebei University
- University of Science and Technology of China
- Prince Sultan University
- Shenyang National Laboratory for Materials Science