Removing the Critical Thickness of Improper Ferroelectrics via Interfacial Reconstruction
The atomic structures at epitaxial film-substrate interfaces determine the scalability of thin films and can result in new phenomena. However, it is challenging to control the structure of the interface. In this work, we report the strong tunability of the epitaxial interface of improper ferroelectric hexagonal ferrites deposited on spinel ferrites, achieving the artificial selection of two types of interfaces that are related by a 90° rotation of in-plane epitaxial relations and feature either disordered or hybrid reconstruction. The hybrid-type interface exhibits characteristic structures of both hexagonal ferrites and spinel ferrites, which remove the critical thickness for improper ferroelectricity. This tunable interfacial structure provides critical insight into controlling interfacial clamping to maintain robust improper ferroelectricity at the two-dimensional limit.
Authors
- Yu Yun
- Xiaoshan Xu (ORCID: https://orcid.org/0000-0002-4363-392X)
- Anjana K. Shah (ORCID: https://orcid.org/0000-0002-3198-081X)
- Rohan Mishra (ORCID: https://orcid.org/0000-0003-1261-0087)
- Arashdeep Singh Thind (ORCID: https://orcid.org/0000-0003-0262-766X)
- Guodong Ren (ORCID: https://orcid.org/0000-0001-6253-8314)
- Xin Li (ORCID: https://orcid.org/0000-0002-7996-8430)
Institutions
- University of Nebraska–Lincoln (US)
- Washington University in St. Louis (US)
- Division of Materials Science and Engineering (AU)
- Drexel University (US)
Publication Details
- Journal
- Nano Letters
- Published
- 2025-08-08
- DOI
- https://doi.org/10.1021/acs.nanolett.5c02517
- Citations
- 1
- Primary Topic
- Ferroelectric and Piezoelectric Materials
- Type
- article
- Field-Weighted Citation Impact
- 0.52
Funders
- National Science Foundation
- U.S. Department of Energy
- Office of Science
- Division of Materials Research
- Division of Electrical, Communications and Cyber Systems
- Oak Ridge National Laboratory