Spectroscopy and Actinometry of Halogen-Containing Inductively Coupled Plasma for Anisotropic Etching

The parameters of halogen-containing inductively coupled plasma of CF4, CF3Br, and C2F4Br2 gases were investigated with the main focus on the study of optical emission spectra of plasma. The results of actinometry showed that concentration of Br is less than concentration of F in both CF3Br and C2F4Br2 plasma in 5–20 mTorr pressure range in ICP reactor. Accurate approximation of molecular spectra showed significant emission of C, CF, CF2 and C2 particles. These facts can mean higher degree of dissociation in ICP reactor than in CCP reactor studied before.