An InGaN/CuSCN photoanode for visible-light photoelectrochemical photodetectors with over tenfold enhanced photocurrent

CuSCN, a wide-bandgap p-type semiconductor, is employed to boost the photocurrent of an InGaN photoanode of a photoelectrochemical photodetector. The extension of the upward energy band bending in InGaN into the depletion region of CuSCN, governed by the respective surface states to form an interface dipole, enhances photocarrier separation to increase the photocurrent by more than an order of magnitude compared to that of the bare InGaN photoanode. This is achieved by the combined optimization of the hole concentration and layer thickness controlled in the adopted electrodeposition process by the electrolyte composition and deposition time. The basic photodetector parameters, including responsivity, specific detectivity, and response time, are also evaluated.

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Publication Details

Journal
Applied Physics Letters
Published
2025-08-04
DOI
https://doi.org/10.1063/5.0269015
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
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article

An InGaN/CuSCN photoanode for visible-light photoelectrochemical photodetectors with over tenfold enhanced photocurrent

Junyong Li, Richard Nötzel, Rongli Deng, Haibin Lin et al.
Applied Physics Letters
Ga2O3 and related materials
article

An InGaN/CuSCN photoanode for visible-light photoelectrochemical photodetectors with over tenfold enhanced photocurrent

Junyong Li, Richard Nötzel, Rongli Deng, Haibin Lin, Xuan Pu, Guanzhao Yang
article en

Abstract

CuSCN, a wide-bandgap p-type semiconductor, is employed to boost the photocurrent of an InGaN photoanode of a photoelectrochemical photodetector. The extension of the upward energy band bending in InGaN into the depletion region of CuSCN, governed by the respective surface states to form an interface dipole, enhances photocarrier separation to increase the photocurrent by more than an order of magnitude compared to that of the bare InGaN photoanode. This is achieved by the combined optimization of the hole concentration and layer thickness controlled in the adopted electrodeposition process by the electrolyte composition and deposition time. The basic photodetector parameters, including responsivity, specific detectivity, and response time, are also evaluated.

Applied Physics LettersVol. 127(5)
South China Normal University (CN)
Openalex Percentile: Top 88%
Ga2O3 and related materials
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