Retrospective Analysis of Survival Rate and Risk Factor of Osstem TS III SA Dental Implants

This retrospective study aimed to evaluate the up to 10-year survival rate of tapered internal dental implants featuring an 11° Morse taper and internal hex connection with sandblasted and acid-etched (SA) surfaces and to determine whether patient-related or procedural variables significantly influence implant longevity. A total of 2474 tapered internal implants featuring an 11° Morse taper and internal hex connection with SA surfaces (Osstem TS III SA) were placed in 1298 patients at Seoul National University Dental Hospital in Korea between 2013 and 2019. Inclusion criteria required at least 5 years of follow-up postprosthesis placement. Variables such as sex, age, diabetes mellitus, smoking status, implant location, diameter, length, surgical protocol, timing, bone augmentation, and prosthesis type were analyzed. Kaplan-Meier survival analysis and Cox proportional hazards modeling were performed using SPSS 29.0. The overall implant survival rate was 98.3%. Peri-implantitis was the leading cause of failure. Cox analysis showed that only sex significantly affected implant survival, with male patients exhibiting a higher risk of failure (HR, 0.347; P = .004). No other clinical or procedural variables, including diabetes, smoking, or implant dimensions, showed statistically significant effects. Within the limitations of this single-center retrospective study, tapered internal implants featuring an 11° Morse taper and internal hex connection with SA surfaces demonstrated excellent long-term clinical outcomes. Among the evaluated factors, only sex had a significant influence on implant survival. To better identify risk factors, future multicenter prospective studies with randomized designs are recommended.