A ${G}_{\mathrm{m}}$-Boosted 3-Stage Amplifier with Gain-Enhancing Feedforward Path for $\mathrm{C}_{\mathrm{L}}$ of 40-160nF

This paper proposes a 3-stage amplifier designed to drive a load capacitor (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex>) exceeding 100 nF. To ensure stability with a large <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex> while achieving high DC gain and sufficient gainbandwidth (GBW), this amplifier uses a transconductance (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$G_{\mathrm{m}}$</tex>) boosting cell and a gain-enhancing feedforward path (GE-FFP). As a result, the amplifier achieves DC gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$&gt;130 \text{dB}$</tex>, GBW of 1.47 MHz, and phase margin (PM) of 51° when driving <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex> of 160 nF. The chip was fabricated in a 28 nm CMOS process.

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Published
2025-06-08
DOI
https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11074920
Primary Topic
Semiconductor materials and devices
Type
article
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article

A ${G}_{\mathrm{m}}$-Boosted 3-Stage Amplifier with Gain-Enhancing Feedforward Path for $\mathrm{C}_{\mathrm{L}}$ of 40-160nF

Sung‐Wan Hong, Hyun-Woo Jeong, Chan-Ho Lee, Sang-Yun Nam
Semiconductor materials and devices
article

A ${G}_{\mathrm{m}}$-Boosted 3-Stage Amplifier with Gain-Enhancing Feedforward Path for $\mathrm{C}_{\mathrm{L}}$ of 40-160nF

Sung‐Wan Hong, Hyun-Woo Jeong, Chan-Ho Lee, Sang-Yun Nam
article en

Abstract

This paper proposes a 3-stage amplifier designed to drive a load capacitor (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex>) exceeding 100 nF. To ensure stability with a large <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex> while achieving high DC gain and sufficient gainbandwidth (GBW), this amplifier uses a transconductance (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$G_{\mathrm{m}}$</tex>) boosting cell and a gain-enhancing feedforward path (GE-FFP). As a result, the amplifier achieves DC gain <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$&gt;130 \text{dB}$</tex>, GBW of 1.47 MHz, and phase margin (PM) of 51° when driving <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathrm{C}_{\mathrm{L}}$</tex> of 160 nF. The chip was fabricated in a 28 nm CMOS process.

Sogang University (KR)
Openalex Percentile: Top 82%
Semiconductor materials and devices
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