Back-Illuminated U-Shape p-i-n SPAD with High PDE and Broad Spectral Response Fabricated in 110nm CIS Foundry Technology

We present a novel U-shape p-i-n SPAD (U-SPAD) and demonstrate the device performance using a back-illuminated (BI) 110 nm CIS foundry technology. The proposed SPAD is designed for outstanding broad spectral response, achieving photon detection efficiency (PDE) of 23.4 % at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$940 \text{nm}, 73.8 {\%}$</tex> at 700 nm, and 50 % at 475 nm, dark count rate (DCR) of about <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$21.6 \text{cps} / \mu \mathrm{m}^{2}$</tex>, about 210 ps timing jitter, and 0.3 % afterpulsing probability (APP) at 21.5 V breakdown voltage and 1.6 V excess voltage. While high-performance SPADs generally require an optimized custom process, the proposed U-SPAD achieves high performance in a standard foundry process without any process modification.

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Publication Details

Published
2025-06-08
DOI
https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11074925
Citations
2
Primary Topic
Advanced Optical Sensing Technologies
Type
article
Field-Weighted Citation Impact
2.38

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article

Back-Illuminated U-Shape p-i-n SPAD with High PDE and Broad Spectral Response Fabricated in 110nm CIS Foundry Technology

Joo‐Hyun Kim, Myung-Jae Lee, Donghee Son, Eunsung Park et al.
2 citations
Advanced Optical Sensing Technologies
2.38
article

Back-Illuminated U-Shape p-i-n SPAD with High PDE and Broad Spectral Response Fabricated in 110nm CIS Foundry Technology

Joo‐Hyun Kim, Myung-Jae Lee, Donghee Son, Eunsung Park, Woo-Young Choi, Doyoon Eom
article en
2 citations

Abstract

We present a novel U-shape p-i-n SPAD (U-SPAD) and demonstrate the device performance using a back-illuminated (BI) 110 nm CIS foundry technology. The proposed SPAD is designed for outstanding broad spectral response, achieving photon detection efficiency (PDE) of 23.4 % at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$940 \text{nm}, 73.8 {\%}$</tex> at 700 nm, and 50 % at 475 nm, dark count rate (DCR) of about <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$21.6 \text{cps} / \mu \mathrm{m}^{2}$</tex>, about 210 ps timing jitter, and 0.3 % afterpulsing probability (APP) at 21.5 V breakdown voltage and 1.6 V excess voltage. While high-performance SPADs generally require an optimized custom process, the proposed U-SPAD achieves high performance in a standard foundry process without any process modification.

Yonsei University (KR)
Yonsei University, Ministry of Trade, Industry and Energy
Industry, innovation and infrastructure
Openalex Percentile: Top 11%
Advanced Optical Sensing Technologies
2.38
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Back-Illuminated U-Shape p-i-n SPAD with High PDE and Broad Spectral Response Fabricated in 110nm CIS Foundry Technology — Joo‐Hyun Kim, Myung-Jae Lee, et al. · (2025) | TGRS Research Map | TGRS