High Density, High Speed STT-MRAM N7 Macros: Material and DTCO Exploration

As SRAM density stalls and process costs rise, Spin Transfer Torque (STT)-MRAM offers a compelling embedded alternative, though hampered by slow writes and limited bitcell gain owing to high write currents. To address this challenge, we present a novel synthetic antiferromagnet (SAF)-based magnetic tunnel junction (MTJ) capable of 1 ppm error-free operation at 5 ns write and 150 uA on 45 nm eCD devices. We further demonstrate reliable switching at 30 nm CD for Iwrite of approximately 30 uA. The DTCO optimizes N7 process and bitcell design, enabling 5 ns, 0.8 p.J/bit macro writes. With a 0.013 um2 bitcell - iso A14/A10 nodes SRAM area, this approach bridges the density and performance gap in advanced technology nodes.

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Publication Details

Published
2025-06-08
DOI
https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11075013
Citations
1
Primary Topic
Magnetic properties of thin films
Type
article
Field-Weighted Citation Impact
1.25
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article

High Density, High Speed STT-MRAM N7 Macros: Material and DTCO Exploration

Siddharth Rao, Maxwel Gama Monteiro, N. Jossart, Jyotirmoy Chatterjee et al.
1 citations
Magnetic properties of thin films
1.25
article

High Density, High Speed STT-MRAM N7 Macros: Material and DTCO Exploration

Siddharth Rao, Maxwel Gama Monteiro, N. Jossart, Jyotirmoy Chatterjee, Alvaro Palomino, Daniele Narducci, Lynn Verschueren, Fernando Garćıa-Redondo, Geert Hellings, M. Garcia Bardon, Gouri Sankar Kar, Xiaoyu Piao, Kurt Wostyn, R. Carpenter
article en
1 citations

Abstract

As SRAM density stalls and process costs rise, Spin Transfer Torque (STT)-MRAM offers a compelling embedded alternative, though hampered by slow writes and limited bitcell gain owing to high write currents. To address this challenge, we present a novel synthetic antiferromagnet (SAF)-based magnetic tunnel junction (MTJ) capable of 1 ppm error-free operation at 5 ns write and 150 uA on 45 nm eCD devices. We further demonstrate reliable switching at 30 nm CD for Iwrite of approximately 30 uA. The DTCO optimizes N7 process and bitcell design, enabling 5 ns, 0.8 p.J/bit macro writes. With a 0.013 um2 bitcell - iso A14/A10 nodes SRAM area, this approach bridges the density and performance gap in advanced technology nodes.

IMEC (BE)
Openalex Percentile: Top 19%
Magnetic properties of thin films
1.25
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