A Back-Illuminated 10 μm-Pitch SPAD Depth Sensor with 42.5% PDE at 940 nm using an Optimized Doping Design

We present a novel single-photon avalanche diode (SPAD) pixel array designed for accurate distance measurement with a high photon detection efficiency (PDE). This study was conducted with a SPAD depth sensor of 10 μm-pitch with the back-illuminated (BI) structure on a 300 mm CMOS platform. To enhance PDE, we optimized the multiplication region design to increase the triggering probability for the Geiger mode, achieving a 92.9% with 3 V excess bias. Additionally, by introducing new doping, enabling a more efficient charge collection, we have achieved a 98.8% charge collection efficiency. Consequently, in the Si-type SPAD technology, we achieve the world's highest PDE of 42.5% at 940 nm.

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Publication Details

Published
2025-06-08
DOI
https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11075014
Citations
2
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
1.46
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article

A Back-Illuminated 10 μm-Pitch SPAD Depth Sensor with 42.5% PDE at 940 nm using an Optimized Doping Design

Toshi Miura, Hidenori Koketsu, H. Honda, Toshiki Iwase et al.
2 citations
Photonic and Optical Devices
1.46
article

A Back-Illuminated 10 μm-Pitch SPAD Depth Sensor with 42.5% PDE at 940 nm using an Optimized Doping Design

Toshi Miura, Hidenori Koketsu, H. Honda, Toshiki Iwase, Jun Ogi, Shoichi Shimada, H. Maeda, T. Wakano, Fumihiko Koga, Keiichi Yokochi, K. Kurata, K. Moriyama, Y. Otake, Hiroshi Takase, Aoi Magori, J. Suzuki, T. Matsui, K. Fujisawa, M. Okazaki, Ryutaro Tsuchida
article en
2 citations

Abstract

We present a novel single-photon avalanche diode (SPAD) pixel array designed for accurate distance measurement with a high photon detection efficiency (PDE). This study was conducted with a SPAD depth sensor of 10 μm-pitch with the back-illuminated (BI) structure on a 300 mm CMOS platform. To enhance PDE, we optimized the multiplication region design to increase the triggering probability for the Geiger mode, achieving a 92.9% with 3 V excess bias. Additionally, by introducing new doping, enabling a more efficient charge collection, we have achieved a 98.8% charge collection efficiency. Consequently, in the Si-type SPAD technology, we achieve the world's highest PDE of 42.5% at 940 nm.

Sony (Taiwan) (TW), Sojo University (JP)
Openalex Percentile: Top 16%
Photonic and Optical Devices
1.46
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