Demonstration of Embedded MRAM with Sub-50 nm MTJ for RAM-Like and MCU Applications

We present the scalability of the MTJ critical dimension (CD) to sub-50 nm on test vehicles at the 16 nm technology node. Using fast-write MTJ films, we demonstrate a high endurance of lE14 cycles with a high-speed 20 ns write pulse width and a sub-ppm bit error rate without ECC for RAM-like applications. With high data retention MTJ films, we achieve 20-year data retention above 150°C and lE6 cycles endurance for MCU applications. This MTJ CD scaling is designed to be compatible with small bitcell, making it suitable for the 5 nm technology node.

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Publication Details

Published
2025-06-08
DOI
https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11075129
Citations
1
Primary Topic
Parallel Computing and Optimization Techniques
Type
article
Field-Weighted Citation Impact
2.27
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article

Demonstration of Embedded MRAM with Sub-50 nm MTJ for RAM-Like and MCU Applications

Kuo‐Ching Tseng, Meng-Ru Jiang, Ming‐Han Tsai, Bo-Hung Lin et al.
1 citations
Parallel Computing and Optimization Techniques
2.27
article

Demonstration of Embedded MRAM with Sub-50 nm MTJ for RAM-Like and MCU Applications

Kuo‐Ching Tseng, Meng-Ru Jiang, Ming‐Han Tsai, Bo-Hung Lin, Ruo‐Qian Wang, Brian Lin, Eric Chien, Perng-Fei Yuh, Wei-Xiang You, C.C. Liu, Butsurin Jinnai, Kevin Huang, Tien-Wei Chiang, Yuxiao Wang, Yuan-Jen Lee, Andrew Wang, Yu-Sheng Chen, Yi-Chun Shih, Chun-Yang Tsai, Jiancheng Huang, Harry Chuang, Chun-Tai Cheng, Ku-Feng Lin, Ming-Lun Lee, Kuo-Feng Huang, Yi Ching Ong
article en
1 citations

Abstract

We present the scalability of the MTJ critical dimension (CD) to sub-50 nm on test vehicles at the 16 nm technology node. Using fast-write MTJ films, we demonstrate a high endurance of lE14 cycles with a high-speed 20 ns write pulse width and a sub-ppm bit error rate without ECC for RAM-like applications. With high data retention MTJ films, we achieve 20-year data retention above 150°C and lE6 cycles endurance for MCU applications. This MTJ CD scaling is designed to be compatible with small bitcell, making it suitable for the 5 nm technology node.

Taiwan Semiconductor Manufacturing Company (Taiwan) (TW)
Openalex Percentile: Top 13%
Parallel Computing and Optimization Techniques
2.27
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