Review of the effect and progress in uniform films prepared by the magnetron sputtering method
This highlight reviews the latest advances in the preparation of uniform films through magnetron sputtering. It provides a detailed discussion on the effects, characterizations, influence factors and optimization of film thickness and uniformity.
Authors
- Aobo Wang (ORCID: https://orcid.org/0000-0002-0747-1855)
- Xinguo Ma (ORCID: https://orcid.org/0000-0002-5651-9720)
- Zhengwang Cheng (ORCID: https://orcid.org/0000-0001-7013-7190)
- Mei Wang (ORCID: https://orcid.org/0000-0002-1196-2016)
- Bin Zhao (ORCID: https://orcid.org/0000-0003-1146-4209)
- Wei Zou (ORCID: https://orcid.org/0000-0002-8683-9880)
- Xinhang Wang
- Jun Gao (ORCID: https://orcid.org/0000-0002-3521-0417)
Institutions
- Hubei University of Technology (CN)
Publication Details
- Journal
- CrystEngComm
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ce00515a
- Citations
- 1
- Primary Topic
- Copper Interconnects and Reliability
- Type
- article
- Field-Weighted Citation Impact
- 0.43