Advances in metal-based photoresist materials for EUV lithography and lithographic mechanisms
With the rapid development of the IC industry, lithography, as a key step in IC manufacturing, is facing challenges in various aspects, such as the light source, photomask and photoresist.
Authors
- Chenguang Ouyang
- Ying Lu (ORCID: https://orcid.org/0000-0002-3545-1026)
- Haojie Yu (ORCID: https://orcid.org/0000-0002-7405-7881)
- Yanhui Zhang (ORCID: https://orcid.org/0000-0002-1244-5723)
- Wang Li (ORCID: https://orcid.org/0000-0002-9235-3414)
- Ying Zhang (ORCID: https://orcid.org/0000-0001-8778-7659)
- Yalong Wang (ORCID: https://orcid.org/0009-0001-8746-0506)
- Zheyi Zhu
Institutions
- State Key Laboratory of Chemical Engineering (CN)
- Zhejiang University (CN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ta04194e
- Citations
- 2
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 1.46