Silicon Nanowire Gate‐All‐Around Cold Source MOSFET With Ultralow Power Dissipation: A Machine‐Learning‐Hamiltonian Accelerated Design

Abstract Exploring gate length scalability and enhancing performance in silicon‐based devices remain viable strategies to extend Moore's Law. However, these efforts have been hindered by deteriorative short‐channel effects and 60 mV dec −1 thermionic limitation of subthreshold swing ( SS ) at room temperature. To address these challenges, a gate‐all‐around (GAA) cold source field‐effect transistors (CSFETs) is designed based on the silicon nanowire (SiNW) with the characteristic of isolated bands, which is identified through a machine‐learning‐Hamiltonian accelerated high‐throughput search. The ab initio quantum transport simulations demonstrate that sub‐10‐nm SiNW CSFETs can exhibit excellent ballistic transport properties, meeting the International Technology Roadmap for Semiconductors (ITRS) criteria for high‐performance and low‐power devices. Thanks to the intrinsic cold source mechanism enabled by the isolated bands of the SiNW homojunction, the SS of SiNW CSFETs surpasses the “Boltzmann's tyranny”, thereby leading to superb gate controllability. The synergistic effects of the cold source and cold drain further reduce the average SS , enhancing the device's potential for ultralow power dissipation. Consequently, the energy‐delay product values are significantly comparable to those of carbon nanotube (CNT) FETs. The work offers a promising candidate for energy‐efficient solutions utilizing mainstream silicon fabrication processes.

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Publication Details

Journal
Advanced Functional Materials
Published
2025-08-03
DOI
https://doi.org/10.1002/adfm.202513807
Citations
1
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.73

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article

Silicon Nanowire Gate‐All‐Around Cold Source MOSFET With Ultralow Power Dissipation: A Machine‐Learning‐Hamiltonian Accelerated Design

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1 citations
Advanced Functional Materials
Semiconductor materials and devices
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article

Silicon Nanowire Gate‐All‐Around Cold Source MOSFET With Ultralow Power Dissipation: A Machine‐Learning‐Hamiltonian Accelerated Design

Saichao Yan, Zhi‐Xin Guo, Menglin Huang, Zhenxing Dai, Shiyou Chen, Hongjun Xiang, Xingao Gong, Kang Wang
article en
1 citations

Abstract

Abstract Exploring gate length scalability and enhancing performance in silicon‐based devices remain viable strategies to extend Moore's Law. However, these efforts have been hindered by deteriorative short‐channel effects and 60 mV dec −1 thermionic limitation of subthreshold swing ( SS ) at room temperature. To address these challenges, a gate‐all‐around (GAA) cold source field‐effect transistors (CSFETs) is designed based on the silicon nanowire (SiNW) with the characteristic of isolated bands, which is identified through a machine‐learning‐Hamiltonian accelerated high‐throughput search. The ab initio quantum transport simulations demonstrate that sub‐10‐nm SiNW CSFETs can exhibit excellent ballistic transport properties, meeting the International Technology Roadmap for Semiconductors (ITRS) criteria for high‐performance and low‐power devices. Thanks to the intrinsic cold source mechanism enabled by the isolated bands of the SiNW homojunction, the SS of SiNW CSFETs surpasses the “Boltzmann's tyranny”, thereby leading to superb gate controllability. The synergistic effects of the cold source and cold drain further reduce the average SS , enhancing the device's potential for ultralow power dissipation. Consequently, the energy‐delay product values are significantly comparable to those of carbon nanotube (CNT) FETs. The work offers a promising candidate for energy‐efficient solutions utilizing mainstream silicon fabrication processes.

Advanced Functional MaterialsVol. 36(5)
Fudan University (CN), Shanghai Fudan Microelectronics (China) (CN), Xi'an Jiaotong University (CN)
National Natural Science Foundation of China, Science and Technology Commission of Shanghai Municipality, National Key Research and Development Program of China
Openalex Percentile: Top 25%
Semiconductor materials and devices
0.73
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