Gaussian-Based Analytical Model for Temperature-Dependent <i>I-V</i> Characteristics of GaN HEMTs

In this paper, an analytical temperature-dependent I-V model of gallium nitride (GaN) high-electron-mobility transistors (HEMTs) is established by using the Gaussian function. Compared with Curtice, Angelov, and their improved models in the literature, the I-V model proposed in this paper has the characteristics of high modeling accuracy and fast modeling speed. For example, the 3rd order (Gm3) derivative modeling accuracy of the modified Curtice at -45∘, 75∘, and 175∘ is 13.81%, 12.09%, and 6.44%, respectively, while at the same temperature, the Gm3 modeling accuracy of the proposed I-V model is 0.77%, 0.52%, and 1.04%, respectively.

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Publication Details

Journal
IEEE Journal of the Electron Devices Society
Published
2025-01-01
DOI
https://doi.org/10.1109/jeds.2025.3594767
Citations
11
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
13.84
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article

Gaussian-Based Analytical Model for Temperature-Dependent I-V Characteristics of GaN HEMTs

Shaohua Zhou, Zhao Li
11 citations
IEEE Journal of the Electron Devices Society
GaN-based semiconductor devices and materials
13.84
article

Gaussian-Based Analytical Model for Temperature-Dependent I-V Characteristics of GaN HEMTs

Shaohua Zhou, Zhao Li
article en
11 citations

Abstract

In this paper, an analytical temperature-dependent I-V model of gallium nitride (GaN) high-electron-mobility transistors (HEMTs) is established by using the Gaussian function. Compared with Curtice, Angelov, and their improved models in the literature, the I-V model proposed in this paper has the characteristics of high modeling accuracy and fast modeling speed. For example, the 3rd order (Gm3) derivative modeling accuracy of the modified Curtice at -45∘, 75∘, and 175∘ is 13.81%, 12.09%, and 6.44%, respectively, while at the same temperature, the Gm3 modeling accuracy of the proposed I-V model is 0.77%, 0.52%, and 1.04%, respectively.

IEEE Journal of the Electron Devices SocietyVol. 13
Zhongyuan University of Technology (CN), Tianjin University (CN)
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GaN-based semiconductor devices and materials
13.84
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