Crystal phase-directed growth of rutile/anatase TiO<sub>2</sub> heterojunctions <i>via in situ</i> stepwise chemical bath deposition below 80 °C

The fabrication of hierarchical TiO<sub>2</sub> phase junctions, such as rutile/anatase heterostructured films, <i>via</i> a low-temperature crystallization, has long been a challenge due to the lack of effective reaction strategies. In this study, we developed a temperature-gradient double-stage chemical bath deposition (CBD) method to produce rutile/anatase TiO<sub>2</sub> thin films.

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Publication Details

Journal
Chemical Communications
Published
2025-01-01
DOI
https://doi.org/10.1039/d5cc03571f
Primary Topic
Semiconductor materials and devices
Type
article
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article

Crystal phase-directed growth of rutile/anatase TiO2 heterojunctions via in situ stepwise chemical bath deposition below 80 °C

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Semiconductor materials and devices
article

Crystal phase-directed growth of rutile/anatase TiO2 heterojunctions via in situ stepwise chemical bath deposition below 80 °C

Shinapol Toranathumkul, Kazuhiro Manseki, D. Takemoto, Naohide Nagaya, Satoshi Wada, Takashi Sugiura, R. Yasuda
article en

Abstract

The fabrication of hierarchical TiO<sub>2</sub> phase junctions, such as rutile/anatase heterostructured films, <i>via</i> a low-temperature crystallization, has long been a challenge due to the lack of effective reaction strategies. In this study, we developed a temperature-gradient double-stage chemical bath deposition (CBD) method to produce rutile/anatase TiO<sub>2</sub> thin films.

Chemical CommunicationsVol. 61(68)
Gifu University (JP)
Clean water and sanitation
Openalex Percentile: Top 83%
Semiconductor materials and devices
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