Design Optimization of SiC CMOS FinFET for High-Temperature Next-Generation SoC Logic Applications

In this study, we demonstrate a high-temperature-operable binary inverter through structural optimization of a SiC CMOS FinFET. The <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$V_{\text{th}}$</tex> and SS were optimized to achieve CMOS-compatible operation. The resulting FinFET-based binary inverter operates at 3.3V, exhibiting a max gain of 8.2 and noise margin of 0.92V even at temperatures up to 500K, confirming its robustness for high-temperature CMOS applications.

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Published
2025-06-08
DOI
https://doi.org/10.23919/snw65111.2025.11097224
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
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article

Design Optimization of SiC CMOS FinFET for High-Temperature Next-Generation SoC Logic Applications

Jae Hwa Seo, Young Jun Yoon, Young Jo Kim, Sung Yun Woo et al.
Silicon Carbide Semiconductor Technologies
article

Design Optimization of SiC CMOS FinFET for High-Temperature Next-Generation SoC Logic Applications

Jae Hwa Seo, Young Jun Yoon, Young Jo Kim, Sung Yun Woo, Taegyun Kwon, Hyoung Woo Kim
article en

Abstract

In this study, we demonstrate a high-temperature-operable binary inverter through structural optimization of a SiC CMOS FinFET. The <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$V_{\text{th}}$</tex> and SS were optimized to achieve CMOS-compatible operation. The resulting FinFET-based binary inverter operates at 3.3V, exhibiting a max gain of 8.2 and noise margin of 0.92V even at temperatures up to 500K, confirming its robustness for high-temperature CMOS applications.

Korea Electrotechnology Research Institute (KR), Uiduk University (KR), Kyungpook National University (KR)
Affordable and clean energy
Openalex Percentile: Top 83%
Silicon Carbide Semiconductor Technologies
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