Field-Stop Static Induction Thyristor (FS-SITH): An Improved High-Voltage Device

The Static Induction Thyristor (SITH) is renowned for its unique channel barrier control mechanism. By incorporating an additional heavily doped N+ region above the anode, we introduce an enhanced version, the Field-Stop Static Induction Thyristor (FS-SITH). This innovation modifies the electric field distribution and significantly boosts the forward blocking voltage capacity while preserving the original control mechanism. Through TCAD simulations, we investigated the channel parameters, barrier control mechanisms, and current-voltage characteristics of both SITH and FS-SITH. Our findings reveal that FS-SITH can block a higher voltage of 1830 V at a reduced gate voltage of -8 V, demonstrating superior performance.

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Publication Details

Published
2025-05-23
DOI
https://doi.org/10.1109/ecie65947.2025.11086662
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
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article

Field-Stop Static Induction Thyristor (FS-SITH): An Improved High-Voltage Device

Guo‐Yang Li, Hairong Li, Xiangqiang Zeng, Yucheng Li et al.
Silicon Carbide Semiconductor Technologies
article

Field-Stop Static Induction Thyristor (FS-SITH): An Improved High-Voltage Device

Guo‐Yang Li, Hairong Li, Xiangqiang Zeng, Yucheng Li, Da Li, Zhixiong Huang
article en

Abstract

The Static Induction Thyristor (SITH) is renowned for its unique channel barrier control mechanism. By incorporating an additional heavily doped N+ region above the anode, we introduce an enhanced version, the Field-Stop Static Induction Thyristor (FS-SITH). This innovation modifies the electric field distribution and significantly boosts the forward blocking voltage capacity while preserving the original control mechanism. Through TCAD simulations, we investigated the channel parameters, barrier control mechanisms, and current-voltage characteristics of both SITH and FS-SITH. Our findings reveal that FS-SITH can block a higher voltage of 1830 V at a reduced gate voltage of -8 V, demonstrating superior performance.

Lanzhou University of Technology (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 83%
Silicon Carbide Semiconductor Technologies
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