Effect of channel length on the electrical performance of a nanoscale MOSFET
In this paper the effect of the channel length on the electrical parameters of the MOSFET was studied. MOSFETs being used extensively in digital circuit applications have made them the main domain of semiconductor circuits. This work investigates the effect of the channel length on several parameters of a MOSFET that has an impact on its performance. This work aims to explain the relationship between channel length and several key performance indicators, such as drain current (I<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">d</inf>), threshold voltage (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</inf>) and others. In semiconductor devices channel length is a vital factor that helps in determining how effectively the transistor can control current flow. As the channel length decreases, we expect changes in the electric field distribution and carrier dynamics, which can significantly affect performance of the device. When we consider shorter channel lengths, they generally lead to higher drain currents at elevated gate voltages, indicating improved switching capabilities and enhanced performance. Adding to this, variations in transconductance (g<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</inf>) show that shorter channels exhibit greater sensitivity to changes in gate voltage (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">gs</inf>). The relationship between channel length (100 nm, 125 nm and 150 nm) and electrical performance is being studied in this work. HfO2 which is having high dielectric constant is used as a dielectric layer. The device structure showed the V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</inf> of about 2.1 V and 1.4637 V of g<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</inf> for 100 nm channel length compared to the higher channel lengths.
Authors
- Arjun Sunil Rao (ORCID: https://orcid.org/0000-0002-8537-3775)
- Basavaraj S. Sannakashappanavar (ORCID: https://orcid.org/0000-0002-8648-9884)
- Maithri Shridhar Bhat
- Malur C. Nagashree
- M Meghashree
- Y Manasa
Institutions
- Manipal Academy of Higher Education (IN)
- Dr. Hari Singh Gour University (IN)
Publication Details
- Published
- 2024-12-20
- DOI
- https://doi.org/10.1109/ariia63345.2024.11051923
- Citations
- 6
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 1.25