Progress and Prospect of Graphene Preparation by PECVD Technology

石墨烯随着工业的发展在各个领域中具有广阔的应用前景，同时单原子层的特殊结构对其各种特性有着显著的影响。因此，稳定制备规模化高质量和可控层数的石墨烯薄膜是实现其在各个领域中应用的基础。根据前人的研究基础，PECVD技术制备石墨烯可以实现石墨烯制备的低温化及高质量生产，调整各个参数对于制备石墨烯至关重要，如衬底、碳前驱体等。本文通过前人对石墨烯制备的研究，结合其相应的研究方法等，归纳了石墨烯制备研究中的问题以及难点，指出了石墨烯的主要研究进展，探讨了不同参数对石墨烯制备的影响，并在此基础上对石墨烯制备的应用前景进行了展望。Graphene has broad application prospects in various fields with the development of industry. Meanwhile, the special structure of a single atomic layer has a significant impact on its various properties. Therefore, the stable preparation of large-scale, high-quality graphene films with controllable layer numbers is the foundation for their application in various fields. Based on the research foundation of predecessors, the PECVD technology for preparing graphene can achieve low-temperature preparation and high-quality production of graphene. Adjusting various parameters is crucial for the preparation of graphene, such as substrates and carbon precursors. Based on the previous research on the preparation of graphene, combined with the corresponding research methods, etc., this paper summarizes the problems and difficulties in the research of graphene preparation, points out the main research progress of graphene, discusses the influence of different parameters on the preparation of graphene, and on this basis, looks forward to the application prospects of graphene preparation.