Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization

In this paper, we investigate different ways to increase the reactivity of Type I or Type II photoinitiators by introducing new latent reactive additives leading to additional initiating radicals, promoting singlet-singlet resonance energy transfer of Type I photoinitiators, overcoming diffusional limit in Type II photoinitiating system by pre-associating ion-pairs, or leading to additional initiating radicals and concomitant dye regeneration. The principles underlying these methods are exposed, and an example system is presented for each of these concepts. It is shown that high photopolymerization rates can be achieved even at very low light irradiances.

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Publication Details

Journal
Journal of Photopolymer Science and Technology
Published
2025-06-24
DOI
https://doi.org/10.2494/photopolymer.38.65
Primary Topic
Photopolymerization techniques and applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization

Xavier Allonas, Christian Ley, Léo Niederst
Journal of Photopolymer Science and Technology
Photopolymerization techniques and applications
article

Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization

Xavier Allonas, Christian Ley, Léo Niederst
article en

Abstract

In this paper, we investigate different ways to increase the reactivity of Type I or Type II photoinitiators by introducing new latent reactive additives leading to additional initiating radicals, promoting singlet-singlet resonance energy transfer of Type I photoinitiators, overcoming diffusional limit in Type II photoinitiating system by pre-associating ion-pairs, or leading to additional initiating radicals and concomitant dye regeneration. The principles underlying these methods are exposed, and an example system is presented for each of these concepts. It is shown that high photopolymerization rates can be achieved even at very low light irradiances.

Journal of Photopolymer Science and TechnologyVol. 38(1)
Université de Haute-Alsace (FR)
Covestro
Openalex Percentile: Top 86%
Photopolymerization techniques and applications
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