Fabrication of a Methacrylic Photo-adhesive Material Incorporating Hydroxypyridyl Groups

For preparation of our all-purpose photo-adhesive material, a methacrylic monomer bearing a hydroxypyridyl group was synthesized. Hydroxypyridyl groups take keto-enol tautomerization reactions according to their micro-environments, and adaptation of the molecular structures for strong interaction (or adhesion) would be expected. A photo-adhesive material was fabricated with the methacrylic monomer, 2-hydroxyethyl methacrylate, and a radical photo-initiator. Photo-adhesion experiments were performed by 2 J/cm2 of UV irradiation (50 mW/cm2) at a wavelength of 365 nm, resulting in higher values of shear stress in cases adding the monomer. It was found that a hydroxypyridyl group of the monomer existed mainly in the keto isomer in a solution of UV-Vis spectral measurements. On the other hand, results on XPS measurements suggested that a part of hydroxypyridyl groups could exist as the enol isomer in the adhesive residue.

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Publication Details

Journal
Journal of Photopolymer Science and Technology
Published
2025-06-24
DOI
https://doi.org/10.2494/photopolymer.38.169
Primary Topic
Photopolymerization techniques and applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Fabrication of a Methacrylic Photo-adhesive Material Incorporating Hydroxypyridyl Groups

Masahiro Furutani, Masaki Matsui
Journal of Photopolymer Science and Technology
Photopolymerization techniques and applications
article

Fabrication of a Methacrylic Photo-adhesive Material Incorporating Hydroxypyridyl Groups

Masahiro Furutani, Masaki Matsui
article en

Abstract

For preparation of our all-purpose photo-adhesive material, a methacrylic monomer bearing a hydroxypyridyl group was synthesized. Hydroxypyridyl groups take keto-enol tautomerization reactions according to their micro-environments, and adaptation of the molecular structures for strong interaction (or adhesion) would be expected. A photo-adhesive material was fabricated with the methacrylic monomer, 2-hydroxyethyl methacrylate, and a radical photo-initiator. Photo-adhesion experiments were performed by 2 J/cm2 of UV irradiation (50 mW/cm2) at a wavelength of 365 nm, resulting in higher values of shear stress in cases adding the monomer. It was found that a hydroxypyridyl group of the monomer existed mainly in the keto isomer in a solution of UV-Vis spectral measurements. On the other hand, results on XPS measurements suggested that a part of hydroxypyridyl groups could exist as the enol isomer in the adhesive residue.

Journal of Photopolymer Science and TechnologyVol. 38(3)
Fukui National College of Technology (JP)
Japan Society for the Promotion of Science
Openalex Percentile: Top 86%
Photopolymerization techniques and applications
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