The Effect of Number of Fins per Transistor on the TID Response of 12LP FinFET Technology

This paper presents an analysis of the total ionizing dose (TID) response of n-channel transistors in the 12LP FinFET technology, with a focus on the impact of fin count per transistor. Previous studies, such as those by Vidana (2023), have shown increased off-state current (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I<sub>DS-off</sub></i>) in n-channel FinFETs caused by charge buildup in shallow trench isolation (STI) oxides. However, these trends vary based on the number of fins used in the device. This work introduces a physics-based data-driven model supported by TCAD simulations to explain the fin count dependence on TID response. The model identifies variability in charge trapping within different STI regions, specifically highlighting the role of silicon nitride layers in mitigating leakage in devices with two or fewer fins. This research not only corroborates prior findings but also provides new insights into the electrostatic sensitivities unique to nanoscale FinFETs, offering a better understanding of TID effects and potential device hardening strategies.

Authors

Institutions

Publication Details

Journal
IEEE Transactions on Nuclear Science
Published
2025-07-24
DOI
https://doi.org/10.1109/tns.2025.3589259
Citations
1
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.73

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

The Effect of Number of Fins per Transistor on the TID Response of 12LP FinFET Technology

Gina R. Poe, Matthew Spear, Jennifer Taggart, Brendan Foran et al.
1 citations
IEEE Transactions on Nuclear Science
Advancements in Semiconductor Devices and Circuit Design
0.73
article

The Effect of Number of Fins per Transistor on the TID Response of 12LP FinFET Technology

Gina R. Poe, Matthew Spear, Jennifer Taggart, Brendan Foran, Sean T. Vibbert, J. S. Kauppila, Aldo Vidana, R. Nathan Nowlin, Stefano Bonaldo, T. D. Haeffner, Hugh Barnaby, L. W. Massengill, Trace Wallace, Nathaniel A. Dodds, B. Dodd, Jereme Neuendank
article en
1 citations

Abstract

This paper presents an analysis of the total ionizing dose (TID) response of n-channel transistors in the 12LP FinFET technology, with a focus on the impact of fin count per transistor. Previous studies, such as those by Vidana (2023), have shown increased off-state current (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I<sub>DS-off</sub></i>) in n-channel FinFETs caused by charge buildup in shallow trench isolation (STI) oxides. However, these trends vary based on the number of fins used in the device. This work introduces a physics-based data-driven model supported by TCAD simulations to explain the fin count dependence on TID response. The model identifies variability in charge trapping within different STI regions, specifically highlighting the role of silicon nitride layers in mitigating leakage in devices with two or fewer fins. This research not only corroborates prior findings but also provides new insights into the electrostatic sensitivities unique to nanoscale FinFETs, offering a better understanding of TID effects and potential device hardening strategies.

IEEE Transactions on Nuclear ScienceVol. 72(8)
University of Padua (IT), The Aerospace Corporation (US), Sandia National Laboratories (US), Reliable Software Resources (United States) (US), Arizona State University (US)
Sandia National Laboratories
Affordable and clean energy
Openalex Percentile: Top 26%
Advancements in Semiconductor Devices and Circuit Design
0.73
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.