Study Of Deposition Parameters Of Silicon Oxide And Silicon Nitride Thin Films Synthesized By Pulsed-Direct Current Reactive Magnetron Sputtering
This work shows the results of a characterization protocol to synthesize silicon dioxide and nitride films by Pulsed sputtering using optical emission spectroscopy to monitor plasma and correlate to the thin films optical properties.
Authors
- R. Sanginés (ORCID: https://orcid.org/0000-0003-2695-0955)
- Noemí Abundiz Cisneros
- Ricardo Mejía
- L. Cruz Gabarain
- E. Terán Hinojosa
Institutions
- Universidad Autónoma de Baja California (MX)
- Centro de Investigación Científica y de Educación Superior de Ensenada (MX)
- Universidad Nacional Autónoma de México (MX)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.fb.6
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 0.00