Optical and Durability Properties of Microwave Plasma Assisted Sputter Deposited Stoichiometric Silicon Nitride
A study of the optical and mechanical properties of stoichiometric Silicon Nitride deposited using microwave plasma assisted sputtering. A coating stress of -317MPa, hardness of 1.3GPa was obtained with a transmittance range of 300nm-5μm.
Authors
- Lewis Fleming (ORCID: https://orcid.org/0000-0003-4767-8399)
- I. W. Martin (ORCID: https://orcid.org/0000-0001-7300-9151)
- Des Gibson (ORCID: https://orcid.org/0000-0003-2851-0072)
- Ian Brinkley
- S. Reid (ORCID: https://orcid.org/0000-0002-9728-3507)
- Connor Lindsay
Institutions
- University of Strathclyde (GB)
- University of Glasgow (GB)
- University of the West of Scotland (GB)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.tb.8
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- University of Glasgow
- University of the West of Scotland
- Science and Technology Facilities Council