Long-term aging characterization of PIAD SiO2 and HfO2 layers

This work deals with the long-term behavior of PIAD SiO 2 and HfO 2 monolayers used in specific LMJ coatings. Spectral and mechanical variations are observed on SiO 2 layers only. Climate chamber tests can stabilize these layers.

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Published
2025-01-01
DOI
https://doi.org/10.1364/oic.2025.md.5
Primary Topic
Semiconductor materials and devices
Type
article
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article

Long-term aging characterization of PIAD SiO2 and HfO2 layers

Marine Chorel, C. Ducros, Arthur Soutenain, Christelle Dublanche-Tixier et al.
3 links
Semiconductor materials and devices
article

Long-term aging characterization of PIAD SiO2 and HfO2 layers

Marine Chorel, C. Ducros, Arthur Soutenain, Christelle Dublanche-Tixier, Éric Lavastre
article en

Abstract

This work deals with the long-term behavior of PIAD SiO 2 and HfO 2 monolayers used in specific LMJ coatings. Spectral and mechanical variations are observed on SiO 2 layers only. Climate chamber tests can stabilize these layers.

CEA CESTA (FR), Centre National de la Recherche Scientifique (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), Laboratoire d’Innovation pour les Technologies des Énergies Nouvelles et les nanomatériaux (FR), Université de Limoges (FR), Université Grenoble Alpes (FR)
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Semiconductor materials and devices
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