Influence of Oxygen Flow and Sub-Stoichiometry on the Optical and Damage Resistance Properties of Hafnium Oxide Thin Films

This study examines how oxygen flow during hafnia coating deposition by ion beam sputtering affects optical properties, film composition, and laser damage performance under ns laser exposure.

Authors

Amira Guediche
L. B. Bayu Aji (ORCID: https://orcid.org/0000-0003-1557-3023)
Raluca A. Negres (ORCID: https://orcid.org/0000-0003-2080-8894)
C. Harthcock
S. Diop

Institutions

Lawrence Livermore National Laboratory (US)

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/oic.2025.wc.3
Citations: 1
Primary Topic: Semiconductor materials and devices
Type: article
Field-Weighted Citation Impact: 0.73

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article

Influence of Oxygen Flow and Sub-Stoichiometry on the Optical and Damage Resistance Properties of Hafnium Oxide Thin Films

Amira Guediche, L. B. Bayu Aji, Raluca A. Negres, C. Harthcock et al.

Jan 1, 2025

1 citations

Semiconductor materials and devices

0.73

article

Influence of Oxygen Flow and Sub-Stoichiometry on the Optical and Damage Resistance Properties of Hafnium Oxide Thin Films

Amira Guediche, L. B. Bayu Aji, Raluca A. Negres, C. Harthcock, S. Diop

January 1, 2025article en

1 citations

Abstract

This study examines how oxygen flow during hafnia coating deposition by ion beam sputtering affects optical properties, film composition, and laser damage performance under ns laser exposure.

Lawrence Livermore National Laboratory (US)

Openalex Percentile: Top 26%

Semiconductor materials and devices

0.73

DOI Source OpenAlex

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Influence of Oxygen Flow and Sub-Stoichiometry on the Optical and Damage Resistance Properties of Hafnium Oxide Thin Films — Amira Guediche, L. B. Bayu Aji, et al. · (2025) | TGRS Research Map | TGRS