Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating

Porous silica thin film bearing low refractive index was successfully prepared using the sol-gel method. By careful selection of raw materials, thin films with both a low refractive index and low scattering can be fabricated.

Authors

Ryoko Suzuki (ORCID: https://orcid.org/0000-0002-4101-2118)

Institutions

Nikon (Japan) (JP)

Publication Details

Published: 2025-01-01
DOI: https://doi.org/10.1364/oic.2025.tha.6
Primary Topic: Optical Coatings and Gratings
Type: article
Field-Weighted Citation Impact: 0.00

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article

Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating

Ryoko Suzuki

Jan 1, 2025

Optical Coatings and Gratings

article

Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating

Ryoko Suzuki

January 1, 2025article en

Abstract

Nikon (Japan) (JP)

Openalex Percentile: Top 84%

Optical Coatings and Gratings

DOI Source OpenAlex

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Fabrication of the Film with Low-refractive Index and Low-scattering for Anti-reflective Coating — Ryoko Suzuki · (2025) | TGRS Research Map | TGRS