Development of Refractive Index Control Technology for Optical Thin Films by a Combination of Sputtering and Electron Beam Evaporation
By controlling the refractive index of SiO 2 optical thin films using a deposition system that combines sputtering and EB evaporation, 51-layer SiO 2 mono-material multilayer coatings, comprising the same deposition material as the substrate, were fabricated.
Authors
- Hiroshi Murotani (ORCID: https://orcid.org/0000-0002-9228-0737)
- Naoya Tajima (ORCID: https://orcid.org/0000-0002-4820-9183)
- Takayuki Matsudaira
Institutions
- Tokai University (JP)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.wa.2
- Primary Topic
- Optical Coatings and Gratings
- Type
- article
- Field-Weighted Citation Impact
- 0.00