Ion Beam Sputtering for Substrate Deposition with a Size of 2m: Simulation and Optimization
The deposition process by ion beam sputtering is scaled to a huge substrate size. Homogeneous coatings are optimized by adjusting the moveable target positions. A digital twin model combines gas flow and atomistic growth simulations.
Authors
- Tarik Kellermann (ORCID: https://orcid.org/0009-0009-2031-5556)
- Holger Badorreck (ORCID: https://orcid.org/0000-0002-7777-0762)
- Andreas Wienke (ORCID: https://orcid.org/0000-0002-8927-6534)
- Detlev Ristau
- Morten Steinecke (ORCID: https://orcid.org/0000-0002-4124-3039)
- Marco Jupé
- Daniel L. Barton (ORCID: https://orcid.org/0000-0002-8386-3201)
Institutions
- Leibniz University Hannover (DE)
- Laser Zentrum Hannover (DE)
- L3S Research Center (DE)
- Fraunhofer Institute for Surface Engineering and Thin Films (DE)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.mc.5
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 0.00