Direct Current and Radio Frequency Plasma Sources for Co-Sputtering of All-Solid-State Electrochromic Devices
This study mainly uses tungsten trioxide (WO 3 ) doped titanium dioxide (TiO 2 ) to prepare complementary all-solid-state electrochromic device, and direct current (DC) and radio frequency (RF) power is used to sputter TiO 2 doped to WO 3 film.
Authors
- S. Shao
- Ri-Jun Li
- Hao Yang Lin (ORCID: https://orcid.org/0000-0001-8810-3327)
- Yongyuan Jiang (ORCID: https://orcid.org/0000-0002-8082-0089)
- Hsi-Chao Chen
- Yu‐Wei Chang (ORCID: https://orcid.org/0000-0003-4370-2988)
- Po-Hung Li
Institutions
- National Yunlin University of Science and Technology (TW)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.tb.6
- Primary Topic
- Transition Metal Oxide Nanomaterials
- Type
- article
- Field-Weighted Citation Impact
- 0.00