Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal optical interference coatings
We present conformal, stress-neutral, low-loss, and durable optical interference coatings fabricated with a novel spatial atomic layer deposition that enables thin film deposition up to two orders of magnitude faster than traditional atomic layer deposition.
Authors
- Sauli Virtanen
- Philipp Maydannik (ORCID: https://orcid.org/0000-0003-3764-8495)
- Sami Sneck
- John Rönn
- Emmanuele Sortino
Institutions
- Beneq (Finland) (FI)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.thc.5
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00