Laser Resistance of Low-Density SiO2 Optical Thin Films by Sputtering and Electron Beam Deposition
This study evaluates the 355 nm laser damage threshold of single-layer SiO 2 films with varying refractive indices, fabricated via simultaneous electron beam evaporation and direct current pulse sputtering deposition.
Authors
- Hiroshi Murotani (ORCID: https://orcid.org/0000-0002-9228-0737)
- Taisei Wakamiya
- Naoya Tajima (ORCID: https://orcid.org/0000-0002-4820-9183)
- Takayuki Matsudaira
- Yuhang Yang (ORCID: https://orcid.org/0000-0002-5293-9728)
Institutions
- Tokai University (JP)
- Japan Steel Works (Japan) (JP)
- Mirai Hospital (JP)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.me.8
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00