Gasochromic Properties of Tungsten Oxide Thin Films Prepared by Glancing Angle Deposition with Electron Beam Evaporation
This work presents gasochromic properties of WO 3 thin films deposited by GLAD technique using EBE and shows the influence of the deposition angle on the change of transmission coefficient upon exposure to hydrogen.
Authors
- J. Domaradzki (ORCID: https://orcid.org/0000-0002-4707-6817)
- Des Gibson (ORCID: https://orcid.org/0000-0003-2851-0072)
- M. Mazur (ORCID: https://orcid.org/0000-0002-6997-4204)
- Wiktoria Weichbrodt (ORCID: https://orcid.org/0009-0007-5086-6346)
Institutions
- Wrocław University of Science and Technology (PL)
- AGH University of Krakow (PL)
- University of the West of Scotland (GB)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.fb.5
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00