Characterization and comparison of thin film stress for a variety of oxide materials, chambers, and deposition techniques
Stress has been evaluated in a variety of thin film materials, across multiple chambers, using different deposition processes. A database has been constructed that allows the prediction of stress induced figure changes for various coating and substrate combinations. The design approach can then be modified accordingly.
Authors
- Nathan Carlie
- Ian Stevenson (ORCID: https://orcid.org/0000-0002-1900-9983)
- Michael S. Middleton (ORCID: https://orcid.org/0000-0002-4247-1287)
- David Ahlstrand
- Nick A. Smith
- Mathias Mende
- Claudio Infante
- Olivia Wheeler-Williams
Institutions
- University of Central Florida (US)
- Genesis HealthCare (US)
- Theologische Fakultät Fulda (DE)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.fa.2
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 0.00