Phase-shift interferometer measurement of anisotropic stress in wide bandgap Zirconium oxide thin films

A self-made phase-shift interferometer with the 3% measured error was used to measure the anisotropic stresses of zirconium oxide (ZrO 2 ) film. The minimum principle and shearing stresses at are -82.98 and 26.79 MPa, respectively.

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Published
2025-01-01
DOI
https://doi.org/10.1364/oic.2025.wd.7
Primary Topic
Optical measurement and interference techniques
Type
article
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article

Phase-shift interferometer measurement of anisotropic stress in wide bandgap Zirconium oxide thin films

T.X. Li, Kun-Hong Chen, Hsi-Chao Chen, Horng‐Chih Lin et al.
Optical measurement and interference techniques
article

Phase-shift interferometer measurement of anisotropic stress in wide bandgap Zirconium oxide thin films

T.X. Li, Kun-Hong Chen, Hsi-Chao Chen, Horng‐Chih Lin, Yu‐Wei Chang, Z. R. Hong, Guanghui Su
article en

Abstract

A self-made phase-shift interferometer with the 3% measured error was used to measure the anisotropic stresses of zirconium oxide (ZrO 2 ) film. The minimum principle and shearing stresses at are -82.98 and 26.79 MPa, respectively.

National Yunlin University of Science and Technology (TW)
Openalex Percentile: Top 84%
Optical measurement and interference techniques
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