Preparation of Anti-reflection Periodic Nanostructure Devices with 3ω High Laser Damage Threshold
Large-area 3ω anti-reflection periodic nanostructure devices have been prepared on the surface of fused quartz by HF etching, EBL, step-and-flash Nanoimprint and ICP etching. It exhibits excellent transmissivity, environmental stability and Laser-induced Damage Threshold.
Authors
- Xinshang Niu (ORCID: https://orcid.org/0000-0001-6326-2954)
- Hongfei Jiao (ORCID: https://orcid.org/0000-0003-2331-9420)
- Lidi Zhang (ORCID: https://orcid.org/0000-0003-3153-4825)
- Xiaochuan Ji
- Xinbin Cheng (ORCID: https://orcid.org/0000-0002-3855-483X)
- Dong‐Dong Li (ORCID: https://orcid.org/0000-0002-8085-9557)
- Jinlong Zhang (ORCID: https://orcid.org/0000-0002-1334-6436)
- Zhanshan Wang (ORCID: https://orcid.org/0000-0002-2161-6934)
- Jingjing Xia (ORCID: https://orcid.org/0000-0002-6629-8554)
Institutions
- Tongji University (CN)
- Applications Research (United States) (US)
Publication Details
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1364/oic.2025.wc.4
- Primary Topic
- Optical Coatings and Gratings
- Type
- article
- Field-Weighted Citation Impact
- 0.00